Structure and morphology of nanostructured oxides synthesized by thermal vaporization/magnetron sputtering and gas condensation

1993 ◽  
Vol 24 (3) ◽  
pp. 315-338 ◽  
Author(s):  
Jackie Y. Ying
ACS Nano ◽  
2016 ◽  
Vol 10 (4) ◽  
pp. 4684-4694 ◽  
Author(s):  
Junlei Zhao ◽  
Ekaterina Baibuz ◽  
Jerome Vernieres ◽  
Panagiotis Grammatikopoulos ◽  
Ville Jansson ◽  
...  

Author(s):  
Hao Li ◽  
Shenwei Wang ◽  
Liyuan Bai ◽  
Kai Ou ◽  
Yanwei Zhang ◽  
...  

Tb2O3:Er light-emitting diodes were prepared by radio-frequency magnetron sputtering method and the EL performance of the devices were studied. The crystal structure and morphology of the annealed films were investigated by XRD and SEM, respectively. The EL spectrum was achieved and the EL principle was discussed. Six emission peaks of Er[Formula: see text] located at 402, 517, 548, 649, 691, and 1,538[Formula: see text]nm were observed, achieving energy transfer from Tb[Formula: see text] to Er[Formula: see text]. In order to study the effect of Er+ doping concentration, the doping concentrations of Tb2O3:Er films were from 5[Formula: see text]at.% to 20[Formula: see text]at.%. The effect on electroluminescence intensity of doping concentration was investigated and the optimal doped concentration was 15[Formula: see text]at. %.


1997 ◽  
Vol 358 (1-2) ◽  
pp. 308-311 ◽  
Author(s):  
A. v. Richthofen ◽  
Rainer Cremer ◽  
Ralph Domnick ◽  
Dieter Neuschütz

2017 ◽  
Vol 31 (16-19) ◽  
pp. 1744050
Author(s):  
Yangsi Liu ◽  
Wei Gao

ZnO nanorods were decorated by Cu nanocrystals via magnetron sputtering to form Cu/ZnO nanocomposite arrays. The crystal structure and morphology of Cu/ZnO nanocomposite arrays were characterized by XRD and SEM. The optical absorbance of Cu/ZnO nanocomposite arrays was measured using a UV-vis spectrophotometer and their potential applications were discussed.


1999 ◽  
Vol 5 (S2) ◽  
pp. 834-835
Author(s):  
R. Mitra ◽  
W.A. Chiou ◽  
J.R. Weertman ◽  
R. Hoffman

Nanocrystalline bulk Ni processed by inert gas condensation of powders followed by compaction has shown impressive mechanical properties with strength values as high as 50% of the theoretical shear strength. However, the process of warm compaction required for densification often leads to grain growth, and flaws in the microstructure. In this study, thin films of nanocrystalline Ni were processed by magnetron sputtering to bypass the compaction process and achieve a microstructure with very narrow grain size distribution. This paper presents the grain size distribution and other microstructural features of nanocrystalline Ni films.Ni films were grown on Si and NaCl substrates, using argon plasma generated with the help of a plasma d.c. magnetron source equipped with a Ni target of 99.99% purity. The target power used was 200 W and the argon pressure was maintained at around 6 millitorr during deposition. A pulsed dc negative bias of 0 or 100 V was applied on the Si substrate.


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