Preparation of polycrystalline Ti-Al-O films by magnetron sputtering ion plating: constitution, structure and morphology

1997 ◽  
Vol 358 (1-2) ◽  
pp. 308-311 ◽  
Author(s):  
A. v. Richthofen ◽  
Rainer Cremer ◽  
Ralph Domnick ◽  
Dieter Neuschütz
Keyword(s):  
Magnetron Sputtering ◽  
Ion Plating ◽  
Structure And Morphology

Silicon- and aluminum-nitride films deposited by reactive low-voltage ion plating and reactive dc-magnetron sputtering

1994 ◽  
Author(s):  
G. W. Vogl ◽  
K. H. Monz ◽  
Quang D. Nguyen ◽  
Michael Huter ◽  
Eduard P. Rille ◽  
...  
Keyword(s):  
Aluminum Nitride ◽  
Magnetron Sputtering ◽  
Low Voltage ◽  
Dc Magnetron Sputtering ◽  
Ion Plating

Investigation on infrared electroluminescence from Er3+-doped Tb2O3 light-emitting diodes

2021 ◽  
pp. 2050005
Author(s):  
Hao Li ◽  
Shenwei Wang ◽  
Liyuan Bai ◽  
Kai Ou ◽  
Yanwei Zhang ◽  
...  
Keyword(s):  
Crystal Structure ◽  
Energy Transfer ◽  
Magnetron Sputtering ◽  
Radio Frequency ◽  
Doping Concentration ◽  
Light Emitting Diodes ◽  
Radio Frequency Magnetron Sputtering ◽  
Light Emitting ◽  
Structure And Morphology ◽  
Electroluminescence Intensity

Tb2O3:Er light-emitting diodes were prepared by radio-frequency magnetron sputtering method and the EL performance of the devices were studied. The crystal structure and morphology of the annealed films were investigated by XRD and SEM, respectively. The EL spectrum was achieved and the EL principle was discussed. Six emission peaks of Er[Formula: see text] located at 402, 517, 548, 649, 691, and 1,538[Formula: see text]nm were observed, achieving energy transfer from Tb[Formula: see text] to Er[Formula: see text]. In order to study the effect of Er+ doping concentration, the doping concentrations of Tb2O3:Er films were from 5[Formula: see text]at.% to 20[Formula: see text]at.%. The effect on electroluminescence intensity of doping concentration was investigated and the optimal doped concentration was 15[Formula: see text]at. %.

Study on microstructure and tribological properties of AlSn films deposited via magnetron sputtering ion plating

2019 ◽  
Vol 483 ◽  
pp. 123-132 ◽  
Author(s):  
Qiao-qin Guo ◽  
Yong-chun Guo ◽  
Zhong Yang ◽  
Jian-ping Li ◽  
Guang-tao Xu
Keyword(s):  
Magnetron Sputtering ◽  
Tribological Properties ◽  
Ion Plating
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