Low temperature epitaxial growth of InP by remote plasma-assisted metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(94)90023-x ◽

1994 ◽

Vol 139 (1-2) ◽

pp. 15-18 ◽

Author(s):

Takashi Sugino ◽

Ken'ichi Kawarai ◽

Masahiro Maeda ◽

Junji Shirafuji

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Metalorganic Chemical

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New Approach to Low-Temperature Epitaxial Growth of GaAs by Photostimulated Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.27.l1556 ◽

1988 ◽

Vol 27 (Part 2, No. 8) ◽

pp. L1556-L1558 ◽

Author(s):

Tetsu Kachi ◽

Hiroshi Ito ◽

Shigeo Terada

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

New Approach ◽

Metalorganic Chemical

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Epitaxial Growth of the GaN Film by Remote-Plasma Metalorganic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.5465 ◽

1998 ◽

Vol 37 (Part 1, No. 10) ◽

pp. 5465-5469 ◽

Author(s):

Wei-Chi Lai ◽

Chun-Yen Chang ◽

Meiso Yokoyama ◽

Jen-Dar Guo ◽

Jian-Shihn Tsang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Remote Plasma ◽

Gan Film ◽

Metalorganic Chemical

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Low-temperature growth and n-type doping of CdTe by the remote-plasma-assisted metalorganic chemical vapor deposition method

Vacuum ◽

10.1016/s0042-207x(00)00333-x ◽

2000 ◽

Vol 59 (2-3) ◽

pp. 678-685 ◽

Author(s):

Madan Niraula ◽

Daisuke Mochizuki ◽

Toru Aoki ◽

Yoichiro Nakanishi ◽

Yoshinori Hatanaka

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Remote Plasma ◽

Temperature Growth ◽

Metalorganic Chemical

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Structural and electrical properties of BaTiO3thin films grown onp‐InSb substrate by metalorganic chemical vapor deposition at low temperature

Applied Physics Letters ◽

10.1063/1.109550 ◽

1993 ◽

Vol 62 (15) ◽

pp. 1788-1790 ◽

Author(s):

T. W. Kim ◽

M. Jung ◽

H. J. Kim ◽

Y. S. Yoon ◽

W. N. Kang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Structural And Electrical Properties ◽

Metalorganic Chemical

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High speed metal‐semiconductor‐metal photodetector manufactured on GaAs by low‐temperature photoassisted metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114129 ◽

1995 ◽

Vol 66 (26) ◽

pp. 3651-3653 ◽

Author(s):

K. S. Boutros ◽

J. C. Roberts ◽

S. M. Bedair ◽

T. F. Carruthers ◽

M. Y. Frankel

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metal Semiconductor Metal ◽

Metalorganic Chemical

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Temperature dependence of solid-vapor compositional relation in epitaxial growth of GaAsxSb1-x by low-pressure metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(94)91032-4 ◽

1994 ◽

Vol 145 (1-4) ◽

pp. 82-86 ◽

Author(s):

Yasuo Iwamura ◽

Takashi Takeuchi ◽

Naozo Watanabe

Keyword(s):

Chemical Vapor Deposition ◽

Temperature Dependence ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Metalorganic Chemical

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Low Temperature Fabrication Of YBa2Cu3O7−x High-Tc Superconducting Thin Films By Plasma-Enhanced Metalorganic Chemical Vapor Deposition

Science and Technology of Thin Film Superconductors 2 ◽

10.1007/978-1-4684-1345-8_32 ◽

1990 ◽

pp. 217-222

Author(s):

J. Zhao ◽

D. W. Noh ◽

C. S. Chern ◽

Y. Q. Li ◽

P. Norris ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Superconducting Thin Films ◽

High Tc ◽

Metalorganic Chemical

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Hetero-Epitaxial Growth of ZnO Film by Temperature-Modulated Metalorganic Chemical Vapor Deposition

Applied Physics Express ◽

10.1143/apex.2.045502 ◽

2009 ◽

Vol 2 ◽

pp. 045502 ◽

Author(s):

Eiji Fujimoto ◽

Masatomo Sumiya ◽

Tsuyoshi Ohnishi ◽

Kenji Watanabe ◽

Mikk Lippmaa ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Zno Film ◽

Metalorganic Chemical

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Modulated precursor flow epitaxial growth of ternary AlGaN by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/j.jcrysgro.2008.07.081 ◽

2008 ◽

Vol 310 (23) ◽

pp. 4880-4884 ◽

Author(s):

Hee Jin Kim ◽

Suk Choi ◽

Dongwon Yoo ◽

Jae-Hyun Ryou ◽

Russell D. Dupuis

Keyword(s):

Chemical Vapor Deposition ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Hydrogen beam stimulated low‐temperature dissociation of organometallics—application for lowering the growth temperature in a metalorganic chemical vapor deposition process

Applied Physics Letters ◽

10.1063/1.103004 ◽

1990 ◽

Vol 56 (20) ◽

pp. 2019-2021 ◽

Author(s):

G. V. Jagannathan ◽

Merrill L. Andrews ◽

Alec T. Habig

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Growth Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Hydrogen Beam ◽

Metalorganic Chemical

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