Hydrogen beam stimulated low‐temperature dissociation of organometallics—application for lowering the growth temperature in a metalorganic chemical vapor deposition process
2000 ◽
Vol 39
(Part 2, No. 7B)
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pp. L726-L729
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1996 ◽
Vol 167
(1-2)
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pp. 8-16
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2006 ◽
Vol 41
(10)
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pp. 3189-3191
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2006 ◽
Vol 137
(4)
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pp. 196-198
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2005 ◽
Vol 20
(4)
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pp. 959-964
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