In Situ electron microscopy study of structural and electrical changes in NiCr thin films

1984 ◽  
Vol 116 (1-3) ◽  
pp. 229
Author(s):  
Á. Barna ◽  
G. Sáfrán ◽  
L. Tóth
2018 ◽  
Vol 52 (3) ◽  
pp. 1139-1149 ◽  
Author(s):  
Jeremy R. Eskelsen ◽  
Jie Xu ◽  
Michelle Chiu ◽  
Ji-Won Moon ◽  
Branford Wilkins ◽  
...  

1993 ◽  
Vol 317 ◽  
Author(s):  
Z. Atzmon ◽  
R. Sharma ◽  
J.W. Mayer ◽  
S.Q. Hong

ABSTRACTNitridation of Cu-Cr alloy films under an NH3 ambient was studied using in situ transmission electron Microscopy. Cu-Cr thin films (40–100 nm) were deposited on a single crystal NaCl substrate by electron beam coevaporation, and were heat treated up to 750°C at 2.5–3.0 Torr NH3. The films were also vacuum (10-6 Torr) annealed under the same conditions for comparison. Initial observation of Cu and Cr crystallization occurred at 470°C for both environmental conditions. The nitridation process of Cr to form CrN was observed initially at 580°C and was followed by evolution of faceted Cu grain growth in the CrN Matrix.


2019 ◽  
Vol 25 (S2) ◽  
pp. 2038-2039 ◽  
Author(s):  
N. Schrenker ◽  
P. Schweizer ◽  
M. Moninger ◽  
N. Karpstein ◽  
M. Mačković ◽  
...  

1987 ◽  
Vol 130 ◽  
pp. 133-138 ◽  
Author(s):  
Lin Xi Wei ◽  
M.O. Ruault ◽  
A. Traverse ◽  
H. Bernas

2003 ◽  
Vol 48 (3) ◽  
pp. 512-514
Author(s):  
1 R. T. Malkhasyan ◽  
R. K. Karakhanyan ◽  
M. N. Nazaryan ◽  
Changmo Sung

2020 ◽  
Vol 539 ◽  
pp. 152265
Author(s):  
Mohamed Ruwaid Rafiuddin ◽  
Anne-Magali Seydoux-Guillaume ◽  
Xavier Deschanels ◽  
Adel Mesbah ◽  
Cedric Baumier ◽  
...  

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