Texture-controlled diamond films synthesized by microwave plasma-enhanced chemical vapour deposition

1996 ◽  
Vol 272 (1) ◽  
pp. 64-70 ◽  
Author(s):  
Yoon-Kee Kim ◽  
Ki-Young Lee ◽  
Jai-Young Lee
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapour

A Comparison of the Surface Properties of DLC and Nanocrystalline Diamond

2007 ◽  
Vol 336-338 ◽  
pp. 1776-1779
Author(s):  
Chong Mu Lee ◽  
Kyung Ha Kim
Keyword(s):  
Chemical Vapour Deposition ◽  
Amorphous Carbon ◽  
Photoelectron Spectroscopy ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapour ◽  
Scanning Force Microscopy ◽  
Nanocrystalline Diamond ◽  
Hard Coatings

Diamond-like carbon (DLC) films have been deposited by radio frequency plasma enhanced chemical vapour deposition (rf-PECVD) with different Ar-CH4 mixtures. Nanocrystalline diamond films have been deposited by microwave plasma-enhanced chemical vapour deposition (MPCVD), using Ar-H2-CH4 mixtures. X-ray photoelectron spectroscopy (XPS) and nanotribological investigation (by scanning force microscopy) have been used to compare the mechanical properties and structures of these films. Highly orientated and non-orientated microcrystalline diamond films and MPCVD-produced amorphous carbon have also been studied by way of comparison. The diamond films exhibit a linear relationship between roughness and the coefficient of friction. The DLC and amorphous carbon have higher friction coefficients than the best performing diamond film, but may more easily be deposited as smooth coating. Possible applications for these various carbon-based films include microelectromechanical components, for which smooth, hard coatings are required.

scholarly journals Effects of Surface Modification of Nanodiamond Particles for Nucleation Enhancement during Its Film Growth by Microwave Plasma Jet Chemical Vapour Deposition Technique

2014 ◽  
Vol 2014 ◽  
pp. 1-5 ◽  
Author(s):  
Chii-Ruey Lin ◽  
Da-Hua Wei ◽  
Minh-Khoa BenDao ◽  
Hong-Ming Chang ◽  
Wei-En Chen ◽  
...  
Keyword(s):  
Surface Modification ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapour ◽  
Plasma Jet ◽  
Nanocrystalline Diamond ◽  
Initial Growth ◽  
Nanocrystalline Diamond Films

The seedings of the substrate with a suspension of nanodiamond particles (NDPs) were widely used as nucleation seeds to enhance the growth of nanostructured diamond films. The formation of agglomerates in the suspension of NDPs, however, may have adverse impact on the initial growth period. Therefore, this paper was aimed at the surface modification of the NDPs to enhance the diamond nucleation for the growth of nanocrystalline diamond films which could be used in photovoltaic applications. Hydrogen plasma, thermal, and surfactant treatment techniques were employed to improve the dispersion characteristics of detonation nanodiamond particles in aqueous media. The seeding of silicon substrate was then carried out with an optimized spin-coating method. The results of both Fourier transform infrared spectroscopy and dynamic light scattering measurements demonstrated that plasma treated diamond nanoparticles possessed polar surface functional groups and attained high dispersion in methanol. The nanocrystalline diamond films deposited by microwave plasma jet chemical vapour deposition exhibited extremely fine grain and high smooth surfaces (~6.4 nm rms) on the whole film. These results indeed open up a prospect of nanocrystalline diamond films in solar cell applications.

Micromechanical properties of diamond films deposited by microwave-plasma-enhanced chemical vapour deposition

1993 ◽  
Vol 2 (5-7) ◽  
pp. 933-938 ◽  
Author(s):  
A. Garcia ◽  
N. Flaño ◽  
J.L. Viviente ◽  
J.I. Onate ◽  
C. Gomez-Aleixandre ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapour ◽  
Micromechanical Properties

X-ray photoelectron and Raman studies of microwave Plasma Assisted Chemical Vapour Deposition (PACVD) diamond films

2008 ◽  
Vol 254 (20) ◽  
pp. 6400-6409 ◽  
Author(s):  
Bernard Humbert ◽  
Nesrine Hellala ◽  
Jean Jacques Ehrhardt ◽  
Silvère Barrat ◽  
Elizabeth Bauer-grosse
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapour ◽  
X Ray

Synthesis and Characterization of Nanocrystalline Diamond Films Deposited by Microwave Plasma Chemical Vapour Deposition

2011 ◽  
Vol 79 ◽  
pp. 187-191 ◽  
Author(s):  
Wen Long Zhou ◽  
Ming Zhang ◽  
Xue Mei Song ◽  
Hui Yan
Keyword(s):  
Surface Roughness ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapour ◽  
Test Point ◽  
Nanocrystalline Diamond ◽  
Nanocrystalline Diamond Films ◽  
Xrd Patterns

Nanocrystalline diamond films have been synthesized by microwave plasma enhanced chemical vapour deposition using H2/CH4as the reactant gas. Nanocrystalline diamond thin films with surface roughness of 11.8 nm were obtained on silicon substrates. The nanocrystallinity, surface roughness and hardness were characterized by the Raman spectroscopy, X-ray diffraction (XRD), atomic force microscopy and Nano Indentation, respectively. The Raman spectra of the films exhibit a band near 1145 cm-1and XRD patterns indicate the presence of nanocrystalline diamond. The hardness value of individual test point is approximately 102 GPa and the average hardness of thin film could reach 86 GPa.

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