SiC thin film preparation by ArF excimer laser chemical vapor deposition Part 1: Rate of photolysis of alkylsilanes by ArF excimer laser and their decomposition products
1997 ◽
Vol 300
(1-2)
◽
pp. 95-100
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1997 ◽
Vol 36
(Part 2, No. 2A)
◽
pp. L150-L153
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1997 ◽
Vol 15
(5)
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pp. 2492-2501
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Keyword(s):
1995 ◽
Vol 34
(Part 1, No. 5A)
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pp. 2229-2234
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1989 ◽
Vol 7
(3)
◽
pp. 429
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1997 ◽
Vol 294
(1)
◽
pp. 35-38
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