ArF excimer laser processing of plasma enhanced chemical vapor deposition silicon oxynitride thin films: Changes in deep ultraviolet transparency and composition

1989 ◽  
Vol 7 (3) ◽  
pp. 429 ◽  
Author(s):  
J. N. Cox
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Laser Processing ◽  
Chemical Vapor ◽  
Silicon Oxynitride ◽  
Deep Ultraviolet ◽  
Arf Excimer Laser

Silicon Dioxide Thin Films Prepared from Silicon Tetraacetate Using ArF Excimer Laser by Chemical Vapor Deposition

1998 ◽  
Vol 37 (Part 1, No. 9A) ◽  
pp. 4938-4942 ◽  
Author(s):  
Atsushi Maruyama ◽  
Naoki Tanaka ◽  
Kazuhiro Nakata ◽  
Ken Yukimura ◽  
Shinzo Yoshikado ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Silicon Dioxide ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Arf Excimer Laser
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