ArF excimer laser chemical vapor deposition a-Si:H/a-AlxO1−x superlattices

Thin Solid Films ◽

10.1016/0040-6090(92)90904-p ◽

1992 ◽

Vol 218 (1-2) ◽

pp. 62-67

Author(s):

K. Uwasawa ◽

F. Ishihara ◽

S. Matsumoto

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Arf Excimer Laser

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SiC thin film preparation by ArF excimer laser chemical vapor deposition Part 1: Rate of photolysis of alkylsilanes by ArF excimer laser and their decomposition products

Thin Solid Films ◽

10.1016/0040-6090(95)08186-0 ◽

1996 ◽

Vol 274 (1-2) ◽

pp. 70-75 ◽

Author(s):

Akio Watanabe ◽

Kazuo Osato ◽

Shinji Ninomiya ◽

Masakazu Mukaida ◽

Tatsuo Tsunoda ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Decomposition Products ◽

Thin Film Preparation ◽

Film Preparation ◽

Arf Excimer Laser

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Surface analysis study of the oxidation of organotin films deposited by ArF excimer laser chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580916 ◽

1997 ◽

Vol 15 (5) ◽

pp. 2492-2501 ◽

Author(s):

R. Larciprete ◽

E. Borsella ◽

P. De Padova ◽

P. Perfetti ◽

C. Crotti

Keyword(s):

Chemical Vapor Deposition ◽

Surface Analysis ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Analysis Study ◽

Arf Excimer Laser

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Electrical Characterization of Silicon Dioxide Thin Film Prepared by ArF Excimer Laser Chemical Vapor Deposition from Silicon Tetraacetate

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.l150 ◽

1997 ◽

Vol 36 (Part 2, No. 2A) ◽

pp. L150-L153 ◽

Author(s):

Atsushi Maruyama ◽

Kazuhiro Nakata ◽

Ken Yukimura ◽

Toshiro Maruyama

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Excimer Laser ◽

Vapor Deposition ◽

Electrical Characterization ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Arf Excimer Laser

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Deposits obtained by photolysis of hexamethyldisilane by ArF excimer laser (SiC thin film preparation by ArF excimer laser chemical vapor deposition, Part 2)

Thin Solid Films ◽

10.1016/s0040-6090(96)09554-5 ◽

1997 ◽

Vol 300 (1-2) ◽

pp. 95-100 ◽

Author(s):

Akio Watanabe ◽

Masakazu Mukaida ◽

Tatsuo Tsunoda ◽

Yoji Imai

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Thin Film Preparation ◽

Film Preparation ◽

Arf Excimer Laser

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Silicon dioxide thin films prepared by ArF excimer laser chemical vapor deposition from silicon tetraacetate

Materials Chemistry and Physics ◽

10.1016/s0254-0584(98)00082-0 ◽

1998 ◽

Vol 54 (1-3) ◽

pp. 197-200

Author(s):

Naoki Tanaka ◽

Atsushi Maruyama ◽

Ken Yukimura ◽

Shinzo Yoshikado ◽

Toshiro Maruyama

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Arf Excimer Laser

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Use of Tetraethylgermane in ArF Excimer Laser Chemical Vapor Deposition of Amorphous Silicon-Germanium Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.2229 ◽

1995 ◽

Vol 34 (Part 1, No. 5A) ◽

pp. 2229-2234 ◽

Author(s):

Hiroshi Uji ◽

Satoru Matsumoto ◽

Hirofumi Higuchi

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Excimer Laser ◽

Vapor Deposition ◽

Silicon Germanium ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Arf Excimer Laser ◽

Germanium Films ◽

Amorphous Silicon Germanium

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ArF excimer laser processing of plasma enhanced chemical vapor deposition silicon oxynitride thin films: Changes in deep ultraviolet transparency and composition

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.584765 ◽

1989 ◽

Vol 7 (3) ◽

pp. 429 ◽

Author(s):

J. N. Cox

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Laser Processing ◽

Chemical Vapor ◽

Silicon Oxynitride ◽

Deep Ultraviolet ◽

Arf Excimer Laser

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Preparation of Conductingpolymer Thin Films by Excimer Laser Chemical Vapor Deposition

Molecular Crystals and Liquid Crystals Science and Technology Section A Molecular Crystals and Liquid Crystals ◽

10.1080/10587259708032242 ◽

1997 ◽

Vol 294 (1) ◽

pp. 35-38 ◽

Author(s):

Satoru Nishio ◽

Shin-Ichi Okada ◽

Yae Minamimoto ◽

Motoyoshi Okumura ◽

Akiyoshi Matsuzaki ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition

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Theoretical study on the fabrication of a microlens using the excimer laser chemical vapor deposition technique

Thin Solid Films ◽

10.1016/s0040-6090(96)08759-7 ◽

1996 ◽

Vol 287 (1-2) ◽

pp. 243-246 ◽

Author(s):

Qingya Wang ◽

Yushu Zhang ◽

Dingsan Gao

Keyword(s):

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Theoretical Study ◽

Chemical Vapor ◽

Deposition Technique ◽

Laser Chemical Vapor Deposition ◽

Chemical Vapor Deposition Technique ◽

Vapor Deposition Technique

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Silicon Dioxide Thin Films Prepared from Silicon Tetraacetate Using ArF Excimer Laser by Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.4938 ◽

1998 ◽

Vol 37 (Part 1, No. 9A) ◽

pp. 4938-4942 ◽

Author(s):

Atsushi Maruyama ◽

Naoki Tanaka ◽

Kazuhiro Nakata ◽

Ken Yukimura ◽

Shinzo Yoshikado ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Arf Excimer Laser

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