Electrical Characterization of Silicon Dioxide Thin Film Prepared by ArF Excimer Laser Chemical Vapor Deposition from Silicon Tetraacetate

1997 ◽  
Vol 36 (Part 2, No. 2A) ◽  
pp. L150-L153 ◽  
Author(s):  
Atsushi Maruyama ◽  
Kazuhiro Nakata ◽  
Ken Yukimura ◽  
Toshiro Maruyama
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Silicon Dioxide ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Electrical Characterization ◽  
Chemical Vapor ◽  
Laser Chemical Vapor Deposition ◽  
Arf Excimer Laser

Silicon Dioxide Thin Films Prepared from Silicon Tetraacetate Using ArF Excimer Laser by Chemical Vapor Deposition

1998 ◽  
Vol 37 (Part 1, No. 9A) ◽  
pp. 4938-4942 ◽  
Author(s):  
Atsushi Maruyama ◽  
Naoki Tanaka ◽  
Kazuhiro Nakata ◽  
Ken Yukimura ◽  
Shinzo Yoshikado ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Silicon Dioxide ◽  
Excimer Laser ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Arf Excimer Laser

Electrical and optical characterization of SiONC dielectric thin film deposited by polymer-source chemical vapor deposition

2007 ◽  
Vol 101 (8) ◽  
pp. 084107 ◽  
Author(s):  
El Hassane Oulachgar ◽  
Cetin Aktik ◽  
Mihai Scarlete ◽  
Starr Dostie ◽  
Rob Sowerby ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Optical Characterization ◽  
Dielectric Thin Film
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