Deposits obtained by photolysis of hexamethyldisilane by ArF excimer laser (SiC thin film preparation by ArF excimer laser chemical vapor deposition, Part 2)
1997 ◽
Vol 300
(1-2)
◽
pp. 95-100
◽
1997 ◽
Vol 36
(Part 2, No. 2A)
◽
pp. L150-L153
◽
1997 ◽
Vol 15
(5)
◽
pp. 2492-2501
◽
Keyword(s):
1995 ◽
Vol 34
(Part 1, No. 5A)
◽
pp. 2229-2234
◽
1989 ◽
Vol 7
(3)
◽
pp. 429
◽
1997 ◽
Vol 294
(1)
◽
pp. 35-38
◽