Properties of a-SiN x .: H films deposited at room temperature by the electron cyclotron resonance plasma method

Philosophical Magazine B ◽

10.1080/13642819608239130 ◽

1996 ◽

Vol 73 (3) ◽

pp. 487-502 ◽

Author(s):

S. Garcia ◽

J. M. Martin ◽

M. Fernandez ◽

I. Martil ◽

G. Gonzalez-diaz

Keyword(s):

Cyclotron Resonance ◽

Room Temperature ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Method ◽

Resonance Plasma

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Deposition of low temperature Si-based insulators by the electron cyclotron resonance plasma method

Thin Solid Films ◽

10.1016/s0040-6090(97)00510-5 ◽

1998 ◽

Vol 317 (1-2) ◽

pp. 116-119 ◽

Author(s):

S Garcia ◽

J.M Martin ◽

I Martil ◽

M Fernandez ◽

G Gonzalez-Diaz

Keyword(s):

Low Temperature ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Method ◽

Resonance Plasma

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Highly homogeneous silica coatings for optical and protective applications deposited by PECVD at room temperature in a planar uniform distributed electron cyclotron resonance plasma reactor.

Thin Solid Films ◽

10.1016/0040-6090(96)80068-x ◽

1995 ◽

Vol 270 (1-2) ◽

pp. 49-54 ◽

Author(s):

J.C. Rostaing ◽

F. Coeuret ◽

J. Pelletier ◽

T. Lagarde ◽

R. Etemadi

Keyword(s):

Cyclotron Resonance ◽

Room Temperature ◽

Electron Cyclotron Resonance ◽

Plasma Reactor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Silica Coatings ◽

Resonance Plasma

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Bonding configuration and density of defects of SiO[sub x]H[sub y] thin films deposited by the electron cyclotron resonance plasma method

Journal of Applied Physics ◽

10.1063/1.1626798 ◽

2003 ◽

Vol 94 (12) ◽

pp. 7462 ◽

Author(s):

E. San Andrés ◽

A. del Prado ◽

I. Mártil ◽

G. González-Dı́az ◽

D. Bravo ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Method ◽

Bonding Configuration ◽

Resonance Plasma

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The structural and dielectric properties of SiOx/a-C,F/SiOx multi-layer thin films deposited by microwave electron cyclotron resonance plasma method

Thin Solid Films ◽

10.1016/j.tsf.2004.06.090 ◽

2005 ◽

Vol 472 (1-2) ◽

pp. 44-48 ◽

Author(s):

Y. Xin ◽

Z.Y. Ning ◽

C. Ye ◽

S.H. Xu ◽

J. Chen ◽

...

Keyword(s):

Dielectric Properties ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Method ◽

Resonance Plasma

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Observation of nanocrystalline diamond in diamondlike carbon films deposited at room temperature in electron cyclotron resonance plasma

Applied Physics Letters ◽

10.1063/1.118912 ◽

1997 ◽

Vol 70 (19) ◽

pp. 2535-2537 ◽

Author(s):

M. Zarrabian ◽

N. Fourches-Coulon ◽

G. Turban ◽

C. Marhic ◽

M. Lancin

Keyword(s):

Cyclotron Resonance ◽

Room Temperature ◽

Electron Cyclotron Resonance ◽

Carbon Films ◽

Electron Cyclotron ◽

Nanocrystalline Diamond ◽

Electron Cyclotron Resonance Plasma ◽

Diamondlike Carbon ◽

Resonance Plasma

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Effects of oxygen content on properties of silicon oxide films prepared at room temperature by sputtering-type electron cyclotron resonance plasma

Journal of Applied Physics ◽

10.1063/1.368683 ◽

1998 ◽

Vol 84 (8) ◽

pp. 4579-4584 ◽

Author(s):

Katsuhiko Furukawa ◽

Yichun Liu ◽

Hiroshi Nakashima ◽

Dawei Gao ◽

Yasuhiro Kashiwazaki ◽

...

Keyword(s):

Oxygen Content ◽

Cyclotron Resonance ◽

Room Temperature ◽

Silicon Oxide ◽

Electron Cyclotron Resonance ◽

Oxide Films ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Thermally induced changes in the optical properties of SiNx:H films deposited by the electron cyclotron resonance plasma method

Journal of Applied Physics ◽

10.1063/1.371008 ◽

1999 ◽

Vol 86 (4) ◽

pp. 2055-2061 ◽

Author(s):

F. L. Martı́nez ◽

A. del Prado ◽

I. Mártil ◽

G. González-Dı́az ◽

B. Selle ◽

...

Keyword(s):

Optical Properties ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Thermally Induced ◽

Plasma Method ◽

Induced Changes ◽

Resonance Plasma

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Electron cyclotron resonance plasma etching of GaSb in Cl[sub 2]/BCl[sub 3]/CH[sub 4]/Ar/H[sub 2] at room temperature

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1596215 ◽

2003 ◽

Vol 21 (4) ◽

pp. 1511 ◽

Author(s):

J. P. Langer ◽

P. S. Dutta

Keyword(s):

Plasma Etching ◽

Cyclotron Resonance ◽

Room Temperature ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Thermal Improvement and Stability of Si3N4/GeNx/p- and n-Ge Structures Prepared by Electron-Cyclotron-Resonance Plasma Nitridation and Sputtering at Room Temperature

Japanese Journal of Applied Physics ◽

10.7567/jjap.51.090204 ◽

2012 ◽

Vol 51 (9R) ◽

pp. 090204

Author(s):

Yukio Fukuda ◽

Hiroshi Okamoto ◽

Takuro Iwasaki ◽

Kohei Izumi ◽

Yohei Otani ◽

...

Keyword(s):

Cyclotron Resonance ◽

Room Temperature ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Nitridation ◽

Thermal Improvement ◽

Resonance Plasma

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Room‐temperature visible photoluminescence from silicon‐rich oxide layers deposited by an electron cyclotron resonance plasma source

Applied Physics Letters ◽

10.1063/1.117566 ◽

1996 ◽

Vol 69 (25) ◽

pp. 3908-3910 ◽

Author(s):

Keunjoo Kim ◽

M. S. Suh ◽

T S. Kim ◽

C. J. Youn ◽

E. K. Suh ◽

...

Keyword(s):

Cyclotron Resonance ◽

Room Temperature ◽

Electron Cyclotron Resonance ◽

Plasma Source ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Oxide Layers ◽

Visible Photoluminescence ◽

Resonance Plasma

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