Crystallinity and electrical properties of tin-doped indium oxide films deposited by DC magnetron sputtering

1991 ◽  
Vol 48-49 ◽  
pp. 269-275 ◽  
Author(s):  
Yuzo Shigesato ◽  
Satoru Takaki ◽  
Takeshi Haranou
Keyword(s):  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Indium Oxide ◽  
Oxide Films ◽  
Dc Magnetron Sputtering ◽  
Indium Oxide Films

Chemical characterization of as-deposited microcrystalline indium oxide films prepared by reactive dc magnetron sputtering

1998 ◽  
Vol 67 (3) ◽  
pp. 295-301 ◽  
Author(s):  
C. Xirouchaki ◽  
K. Moschovis ◽  
E. Chatzitheodoridis ◽  
G. Kiriakidis ◽  
P. Morgen
Keyword(s):  
Magnetron Sputtering ◽  
Indium Oxide ◽  
Oxide Films ◽  
Chemical Characterization ◽  
Dc Magnetron Sputtering ◽  
Indium Oxide Films

Study on Crystallinity of Tin-Doped Indium Oxide Films Deposited by DC Magnetron Sputtering

1998 ◽  
Vol 37 (Part 1, No. 4A) ◽  
pp. 1870-1876 ◽  
Author(s):  
Pung Keun Song ◽  
Yuzo Shigesato ◽  
Itaru Yasui ◽  
Cleva W. Ow-Yang ◽  
David C. Paine
Keyword(s):  
Magnetron Sputtering ◽  
Indium Oxide ◽  
Oxide Films ◽  
Dc Magnetron Sputtering ◽  
Indium Oxide Films

Photoluminescence and electrical properties of erbium‐doped indium oxide films prepared by rf sputtering

1994 ◽  
Vol 76 (12) ◽  
pp. 8209-8211 ◽  
Author(s):  
Hong Koo Kim ◽  
Cheng Chung Li ◽  
Gerald Nykolak ◽  
Philippe C. Becker
Keyword(s):  
Electrical Properties ◽  
Indium Oxide ◽  
Oxide Films ◽  
Rf Sputtering ◽  
Erbium Doped ◽  
Indium Oxide Films
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