Characterization of Sn-5at.%Sb mixed oxide catalyst studied by x-ray photoelectron spectroscopy and Auger electron spectroscopy

B. Viswanathan; S. Chokkalingam; T.K. Varadarajan; S. Badrinarayanan

doi:10.1016/0257-8972(86)90058-7

Characterization of Sn-5at.%Sb mixed oxide catalyst studied by x-ray photoelectron spectroscopy and Auger electron spectroscopy

Surface and Coatings Technology ◽

10.1016/0257-8972(86)90058-7 ◽

1986 ◽

Vol 28 (2) ◽

pp. 201-206 ◽

Cited By ~ 5

Author(s):

B. Viswanathan ◽

S. Chokkalingam ◽

T.K. Varadarajan ◽

S. Badrinarayanan

Keyword(s):

Auger Electron Spectroscopy ◽

Mixed Oxide ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Oxide Catalyst ◽

X Ray ◽

Mixed Oxide Catalyst

Characterization of low‐resistivity indium oxide films by Auger electron spectroscopy, x‐ray photoelectron spectroscopy, and x‐ray diffraction and correlation between their properties, composition, and texture

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579891 ◽

1996 ◽

Vol 14 (2) ◽

pp. 293-298 ◽

Cited By ~ 24

Author(s):

J. I. Jeong ◽

J. H. Moon ◽

J. H. Hong ◽

J.‐S. Kang ◽

Y. Fukuda ◽

...

Keyword(s):

Auger Electron Spectroscopy ◽

Indium Oxide ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Oxide Films ◽

X Ray Diffraction ◽

X Ray ◽

Low Resistivity

Auger electron spectroscopy and X-ray photoelectron spectroscopy characterization of the oxidation of austenitic Fe-26Mn-7Al-0.9C alloy in atmosphere

Materials Chemistry and Physics ◽

10.1016/0254-0584(95)01536-1 ◽

1995 ◽

Vol 41 (4) ◽

pp. 251-256

Author(s):

H.C. Swart ◽

G.L.P. Berning

Keyword(s):

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

X Ray

Characterization of thin films on the nanometer scale by Auger electron spectroscopy and X-ray photoelectron spectroscopy

Applied Surface Science ◽

10.1016/j.apsusc.2004.06.012 ◽

2005 ◽

Vol 239 (3-4) ◽

pp. 470-480 ◽

Cited By ~ 35

Author(s):

C.J. Powell ◽

A. Jablonski ◽

W.S.M. Werner ◽

W. Smekal

Keyword(s):

Thin Films ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Nanometer Scale ◽

X Ray

X-ray photoelectron spectroscopy, X-ray excited Auger electron spectroscopy and time-of-flight secondary ion mass spectroscopy characterization of carbon fibres activated by d.c. corona discharge at ambient pressure and temperature

Journal of Electron Spectroscopy and Related Phenomena ◽

10.1016/s0368-2048(97)00068-6 ◽

1997 ◽

Vol 85 (3) ◽

pp. 179-191 ◽

Cited By ~ 18

Author(s):

E Desimoni ◽

A.M Salvi ◽

F Langerame ◽

J.F Watts

Keyword(s):

Auger Electron Spectroscopy ◽

Mass Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Ambient Pressure ◽

Carbon Fibres ◽

X Ray ◽

Secondary Ion

Corrigendum to “Characterization of thin films on the nanometer scale by Auger electron spectroscopy and X-ray photoelectron spectroscopy”[Applied Surface Science 239 (2005) 470–480]

Applied Surface Science ◽

10.1016/s0169-4332(05)00046-2 ◽

2005 ◽

Vol 242 (3-4) ◽

pp. 219

Author(s):

C POWELL ◽

A JABLONSKI ◽

W WERNER ◽

W SMEKAL

Keyword(s):

Thin Films ◽

Auger Electron Spectroscopy ◽

Surface Science ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Nanometer Scale ◽

X Ray

Corrigendum to “Characterization of thin films on the nanometer scale by Auger electron spectroscopy and X-ray photoelectron spectroscopy”

Applied Surface Science ◽

10.1016/j.apsusc.2005.01.021 ◽

2005 ◽

Vol 242 (3-4) ◽

pp. 219 ◽

Cited By ~ 1

Author(s):

C.J. Powell ◽

A. Jablonski ◽

W.S.M. Werner ◽

W. Smekal

Keyword(s):

Thin Films ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Nanometer Scale ◽

X Ray

Characterization of conducting molecular films on silicon: Auger electron spectroscopy, X-ray photoelectron spectroscopy, atomic force microscopy and surface photovoltage

Applied Surface Science ◽

10.1016/s0169-4332(98)00924-6 ◽

1999 ◽

Vol 142 (1-4) ◽

pp. 591-597 ◽

Cited By ~ 19

Author(s):

Alexei Komolov ◽

Kjeld Schaumburg ◽

Preben J Møller ◽

Vadim Monakhov

Keyword(s):

Atomic Force Microscopy ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Photovoltage ◽

X Ray ◽

Force Microscopy ◽

Atomic Force

Characterization of nitride coatings by Auger electron spectroscopy and x‐ray photoelectron spectroscopy

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.573680 ◽

1986 ◽

Vol 4 (6) ◽

pp. 2789-2796 ◽

Cited By ~ 125

Author(s):

S. Hofmann

Keyword(s):

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

X Ray ◽

Nitride Coatings

Characterization of Copper Palladium Oxide Solid Solutions by X-ray Diffraction, X-ray Photoelectron Spectroscopy, and Auger Electron Spectroscopy

The Journal of Physical Chemistry C ◽

10.1021/jp310344r ◽

2013 ◽

Vol 117 (14) ◽

pp. 7039-7049 ◽

Cited By ~ 15

Author(s):

Gregory L. Christensen ◽

Marjorie A. Langell

Keyword(s):

Auger Electron Spectroscopy ◽

Solid Solutions ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Palladium Oxide ◽

X Ray Diffraction ◽

X Ray

Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Determination of lateral resolution, analysis area, and sample area viewed by the analyser

10.3403/30124424 ◽

2005 ◽

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Resolution Analysis ◽

Surface Chemical Analysis