Characterization of low‐resistivity indium oxide films by Auger electron spectroscopy, x‐ray photoelectron spectroscopy, and x‐ray diffraction and correlation between their properties, composition, and texture

Indium Oxide ◽

Electron Spectroscopy ◽

Auger Electron ◽

Oxide Films ◽

X Ray Diffraction ◽

X Ray ◽

Low Resistivity

Characterization of Copper Palladium Oxide Solid Solutions by X-ray Diffraction, X-ray Photoelectron Spectroscopy, and Auger Electron Spectroscopy

The Journal of Physical Chemistry C ◽

10.1021/jp310344r ◽

2013 ◽

Vol 117 (14) ◽

pp. 7039-7049 ◽

Cited By ~ 15

Author(s):

Gregory L. Christensen ◽

Marjorie A. Langell

Keyword(s):

Solid Solutions ◽

Electron Spectroscopy ◽

Auger Electron ◽

Palladium Oxide ◽

X Ray Diffraction ◽

X Ray

ChemInform Abstract: An Investigation of Thin Oxide Films Thermally Grown in situ on Fe-24 Cr and Fe- 24 Cr-ll Mo by Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy.

Chemischer Informationsdienst ◽

10.1002/chin.198642031 ◽

1986 ◽

Vol 17 (42) ◽

Author(s):

H. J. MATHIEU ◽

D. LANDOLT

Keyword(s):

Electron Spectroscopy ◽

Auger Electron ◽

Oxide Films ◽

X Ray ◽

Thin Oxide Films ◽

Thin Oxide ◽

Thermally Grown

Characterization of Sn-5at.%Sb mixed oxide catalyst studied by x-ray photoelectron spectroscopy and Auger electron spectroscopy

Surface and Coatings Technology ◽

10.1016/0257-8972(86)90058-7 ◽

1986 ◽

Vol 28 (2) ◽

pp. 201-206 ◽

Cited By ~ 5

Author(s):

B. Viswanathan ◽

S. Chokkalingam ◽

T.K. Varadarajan ◽

S. Badrinarayanan

Keyword(s):

Mixed Oxide ◽

Electron Spectroscopy ◽

Auger Electron ◽

Oxide Catalyst ◽

X Ray ◽

Mixed Oxide Catalyst

Auger electron spectroscopy and X-ray photoelectron spectroscopy characterization of the oxidation of austenitic Fe-26Mn-7Al-0.9C alloy in atmosphere

Materials Chemistry and Physics ◽

10.1016/0254-0584(95)01536-1 ◽

1995 ◽

Vol 41 (4) ◽

pp. 251-256

Author(s):

H.C. Swart ◽

G.L.P. Berning

Keyword(s):

Electron Spectroscopy ◽

Auger Electron ◽

X Ray

Formation and diffusion properties of oxide films on metals and on nitride coatings studied with Auger electron spectroscopy and X-ray photoelectron spectroscopy

Thin Solid Films ◽

10.1016/0040-6090(90)90216-z ◽

1990 ◽

Vol 193-194 ◽

pp. 648-664 ◽

Cited By ~ 77

Author(s):

S Hofmann

Keyword(s):

Electron Spectroscopy ◽

Auger Electron ◽

Oxide Films ◽

X Ray ◽

Nitride Coatings ◽

And Diffusion ◽

Diffusion Properties

Characterization of thin films on the nanometer scale by Auger electron spectroscopy and X-ray photoelectron spectroscopy

10.1016/j.apsusc.2004.06.012 ◽

2005 ◽

Vol 239 (3-4) ◽

pp. 470-480 ◽

Cited By ~ 35

Author(s):

C.J. Powell ◽

A. Jablonski ◽

W.S.M. Werner ◽

W. Smekal

Keyword(s):

Thin Films ◽

Electron Spectroscopy ◽

Auger Electron ◽

Nanometer Scale ◽

X Ray

X-ray photoelectron spectroscopy, X-ray excited Auger electron spectroscopy and time-of-flight secondary ion mass spectroscopy characterization of carbon fibres activated by d.c. corona discharge at ambient pressure and temperature

Journal of Electron Spectroscopy and Related Phenomena ◽

10.1016/s0368-2048(97)00068-6 ◽

1997 ◽

Vol 85 (3) ◽

pp. 179-191 ◽

Cited By ~ 18

Author(s):

E Desimoni ◽

A.M Salvi ◽

F Langerame ◽

J.F Watts

Keyword(s):

Mass Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Ambient Pressure ◽

Carbon Fibres ◽

X Ray ◽

Secondary Ion

Corrigendum to “Characterization of thin films on the nanometer scale by Auger electron spectroscopy and X-ray photoelectron spectroscopy”[Applied Surface Science 239 (2005) 470–480]

10.1016/s0169-4332(05)00046-2 ◽

2005 ◽

Vol 242 (3-4) ◽

pp. 219

Author(s):

C POWELL ◽

A JABLONSKI ◽

W WERNER ◽

W SMEKAL

Keyword(s):

Thin Films ◽

Surface Science ◽

Electron Spectroscopy ◽

Auger Electron ◽

Nanometer Scale ◽

X Ray

Corrigendum to “Characterization of thin films on the nanometer scale by Auger electron spectroscopy and X-ray photoelectron spectroscopy”

10.1016/j.apsusc.2005.01.021 ◽

2005 ◽

Vol 242 (3-4) ◽

pp. 219 ◽

Cited By ~ 1

Author(s):

C.J. Powell ◽

A. Jablonski ◽

W.S.M. Werner ◽

W. Smekal

Keyword(s):

Thin Films ◽

Electron Spectroscopy ◽

Auger Electron ◽

Nanometer Scale ◽

X Ray

Characterization of conducting molecular films on silicon: Auger electron spectroscopy, X-ray photoelectron spectroscopy, atomic force microscopy and surface photovoltage

10.1016/s0169-4332(98)00924-6 ◽

1999 ◽

Vol 142 (1-4) ◽

pp. 591-597 ◽

Cited By ~ 19

Author(s):

Alexei Komolov ◽

Kjeld Schaumburg ◽

Preben J Møller ◽

Vadim Monakhov

Keyword(s):

Atomic Force Microscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Photovoltage ◽

X Ray ◽

Force Microscopy ◽

Atomic Force