Thin copper films deposited by low temperature plasma-enhanced metal organic chemical vapour deposition using copper-acetylacetonate

1993 ◽  
Vol 59 (1-3) ◽  
pp. 212-216 ◽  
Author(s):  
A. Hamerich ◽  
L. Lottermoser ◽  
J. Müller
Keyword(s):  
Low Temperature ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Organic Chemical ◽  
Copper Films ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Copper Acetylacetonate ◽  
Metal Organic

The Effects of Deposition temperature on the Growth of Copper films produced by low pressure metal-organic chemical vapour deposition

1995 ◽  
Vol 391 ◽  
Author(s):  
S.S. Yoon ◽  
S.W. Kang ◽  
S.S. Chun
Keyword(s):  
Chemical Vapour Deposition ◽  
Deposition Temperature ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Pressure ◽  
Organic Chemical ◽  
Copper Films ◽  
Cross Sectional ◽  
Initial Stage ◽  
Metal Organic

AbstractCopper was deposited onto TiN by low pressure metal-organic chemical vapour deposition, using hfacCu(I)TMVS and argon carrier gas. The effects of the deposition temperature on the growth of copper films were investigated by observing the surface morphology and the cross sectional morphology of copper films. At the initial stage of growth, copper films tended to have the island-like growth mode, irrespective of the deposition temperatures. It was also observed that the aspect ratio(=height to width) of the islands gradually increased as the deposition temperature increased. The poorer movability of the copper atoms at the higher deposition temperature was evaluated on the basis of hindering effect by the following copper deposits.

Low-temperature plasma enhanced chemical vapour deposition of carbon nanotubes

2004 ◽  
Vol 13 (4-8) ◽  
pp. 1171-1176 ◽  
Author(s):  
S. Hofmann ◽  
B. Kleinsorge ◽  
C. Ducati ◽  
A.C. Ferrari ◽  
J. Robertson
Keyword(s):  
Carbon Nanotubes ◽  
Low Temperature ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Temperature Plasma ◽  
Temperature Plasma

Low-temperature plasma-enhanced chemical vapour deposition of transfer-free graphene thin films

2015 ◽  
Vol 158 ◽  
pp. 436-438 ◽  
Author(s):  
Maisara Othman ◽  
Richard Ritikos ◽  
Syed Muhammad Hafiz ◽  
Noor Hamizah Khanis ◽  
Nur Maisarah Abdul Rashid ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Free Graphene
Sign in / Sign up

Export Citation Format

Share Document