Electron-beam-induced current and atomic force microscopy studies on silicon etch steps created by reactive ion etching and reactive ion beam etching

1994 ◽  
Vol 24 (1-3) ◽  
pp. 223-225
Author(s):  
G. Jäger-Waldau ◽  
H.-U. Habermeier ◽  
G. Zwicker ◽  
E. Bucher
Keyword(s):  
Atomic Force Microscopy ◽  
Electron Beam ◽  
Ion Beam ◽  
Reactive Ion Etching ◽  
Induced Current ◽  
Ion Etching ◽  
Ion Beam Etching ◽  
Force Microscopy ◽  
Atomic Force ◽  
Electron Beam Induced Current

scholarly journals Fabrication of probe tips via the FIB method for nanodiagnostics of the surface of solids by atomic force microscopy

2021 ◽  
Vol 2086 (1) ◽  
pp. 012204
Author(s):  
D J Rodriguez ◽  
A V Kotosonova ◽  
H A Ballouk ◽  
N A Shandyba ◽  
O I Osotova ◽  
...  
Keyword(s):  
Atomic Force Microscopy ◽  
Atomic Force Microscope ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Contact Mode ◽  
Ion Etching ◽  
Force Microscopy ◽  
Atomic Force

Abstract In this work, we carried out an investigation of commercial atomic force microscope (AFM) probes for contact and semi-contact modes, which were modified by focused ion beam (FIB). This method was used to modify the original tip shape of silicon AFM probes, by ion-etching and ion-enhance gas deposition. we show a better performance of the FIB-modified probes in contrast with the non-modified commercial probes. These results were obtained after using both probes in semi-contact mode in a calibration grating sample.

Electron Beam Induced Current Imaging of Silicon Oxide Damage Due to Reactive Ion Etching

1996 ◽  
Vol 51-52 ◽  
pp. 359-366
Author(s):  
Hary Kirk ◽  
Zbigniew J. Radzimski ◽  
A. Romanowski ◽  
George A. Rozgonyi
Keyword(s):  
Electron Beam ◽  
Silicon Oxide ◽  
Reactive Ion Etching ◽  
Induced Current ◽  
Ion Etching ◽  
Electron Beam Induced Current ◽  
Oxide Damage

The reactive ion etching of Bi2Ti2O7 thin films on silicon substrates and its image in atomic force microscopy

2002 ◽  
Vol 235 (1-4) ◽  
pp. 411-414 ◽  
Author(s):  
Zhuo Wang ◽  
Daliang Sun ◽  
Jifan Hu ◽  
Deliang Cui ◽  
Xiaohong Xu ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Force Microscopy ◽  
Reactive Ion Etching ◽  
Silicon Substrates ◽  
Ion Etching ◽  
Force Microscopy ◽  
Atomic Force

Fabrication of Carbon Nanotube Probes in Atomic Force Microscopy

2009 ◽  
Vol 76-78 ◽  
pp. 497-501 ◽  
Author(s):  
Zong Wei Xu ◽  
Feng Zhou Fang ◽  
Xiao Tang Hu
Keyword(s):  
Atomic Force Microscopy ◽  
Electron Beam ◽  
Carbon Nanotube ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Milling Process ◽  
Deposition Method ◽  
Bonding Force ◽  
Force Microscopy ◽  
Atomic Force

Carbon nanotube (CNT) probe used in atomic force microscopy (AFM) was fabricated by using electron beam induced Pt deposition method. The bonding force for CNT probe was found to be larger than 500nN. The nanotube probe’s length was shortened by focused ion beam milling process. It is confirmed that the CNT probe shows higher aspect ratio than the Si probe. The nanotube probes with fullerene-like cap end present higher imaging resolution than those with open end.

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