THE Si-SiO2 INTERFACE: OXIDE CHARGE, ELECTRON AFFINITY AND FAST SURFACE STATES

1978 ◽  
pp. 438-442
Author(s):  
L.A. Kasprzak ◽  
A.K. Gaind
Keyword(s):  
Electron Affinity ◽  
Surface States ◽  
Oxide Charge

scholarly journals Electron affinity and surface states of GaN m -plane facets: Implication for electronic self-passivation

2018 ◽  
Vol 97 (11) ◽  
Author(s):  
V. Portz ◽  
M. Schnedler ◽  
H. Eisele ◽  
R. E. Dunin-Borkowski ◽  
Ph. Ebert
Keyword(s):  
Electron Affinity ◽  
Surface States

Influence of metallic surface states on electron affinity of epitaxial AlN films

2017 ◽  
Vol 407 ◽  
pp. 255-259 ◽  
Author(s):  
Monu Mishra ◽  
Shibin Krishna ◽  
Neha Aggarwal ◽  
Govind Gupta
Keyword(s):  
Electron Affinity ◽  
Surface States ◽  
Metallic Surface

Semiconductor surfaces

2020 ◽  
pp. 193-227
Author(s):  
Sandip Tiwari
Keyword(s):  
Symmetry Breaking ◽  
Surface Reconstruction ◽  
Electron Affinity ◽  
Surface States ◽  
The State ◽  
Semiconductor Surfaces ◽  
Classical View ◽  
Probe Surface ◽  
State Evolution ◽  
Evolution Approach

This chapter discusses the electronic, phononic and atomic behavior at surfaces. Symmetry breaking at the surface causes the emergence of new properties as the state description changes. Starting with an introduction of the semi-classical view, a bulk-based view of workfunction and electron affinity and cautions related to them, toy models are employed to explore the evolution of states at the surface. For electrons, propagating Bloch states persist to the surface but there are also states that are confined. Properties of these confined states and surface states are explored. The implications of stress and of surface reconstruction are discussed to elucidate the atomic rearranging that arises in semiconductors of interest when symmetries change. The state evolution approach is then extended to probe surface phonons. Again, bulk modes persist up to the surface, but there can also be surface-confined modes as well as surface-propagating modes.

Surface States and Negative Electron Affinity in Polyethylene

2001 ◽  
Vol 87 (7) ◽  
Author(s):  
M. C. Righi ◽  
S. Scandolo ◽  
S. Serra ◽  
S. Iarlori ◽  
E. Tosatti ◽  
...  
Keyword(s):  
Electron Affinity ◽  
Surface States ◽  
Negative Electron Affinity

Zero-loss omega-filtered REM and RHEED on the new Zeiss 912

1991 ◽  
Vol 49 ◽  
pp. 616-617
Author(s):  
J.C.H. Spence ◽  
J. Mayer
Keyword(s):  
Electron Microscopy ◽  
Materials Science ◽  
Surface States ◽  
Ccd Camera ◽  
Dark Field ◽  
Ion Pump ◽  
Magnetic Imaging ◽  
Reflection Electron Microscopy ◽  
Diffraction Patterns ◽  
Large Background

The Zeiss 912 is a new fully digital, side-entry, 120 Kv TEM/STEM instrument for materials science, fitted with an omega magnetic imaging energy filter. Pumping is by turbopump and ion pump. The magnetic imaging filter allows energy-filtered images or diffraction patterns to be recorded without scanning using efficient parallel (area) detection. The energy loss intensity distribution may also be displayed on the screen, and recorded by scanning it over the PMT supplied. If a CCD camera is fitted and suitable new software developed, “parallel ELS” recording results. For large fields of view, filtered images can be recorded much more efficiently than by Scanning Reflection Electron Microscopy, and the large background of inelastic scattering removed. We have therefore evaluated the 912 for REM and RHEED applications. Causes of streaking and resonance in RHEED patterns are being studied, and a more quantitative analysis of CBRED patterns may be possible. Dark field band-gap REM imaging of surface states may also be possible.

A Multi-Layer Approach to the Equation of Motion Coupled-Cluster Method for the Electron Affinity

2020 ◽  
Author(s):  
Soumi Haldar ◽  
Achintya Kumar Dutta
Keyword(s):  
Electron Affinity ◽  
Electron Attachment ◽  
Equation Of Motion ◽  
Cluster Method ◽  
Coupled Cluster ◽  
Coupled Cluster Method ◽  
Large Molecules ◽  
Layer Method ◽  
Speed Up ◽  
Attachment Process

We have presented a multi-layer implementation of the equation of motion coupled-cluster method for the electron affinity, based on local and pair natural orbitals. The method gives consistent accuracy for both localized and delocalized anionic states. It results in many fold speedup in computational timing as compared to the canonical and DLPNO based implementation of the EA-EOM-CCSD method. We have also developed an explicit fragment-based approach which can lead to even higher speed-up with little loss in accuracy. The multi-layer method can be used to treat the environmental effect of both bonded and non-bonded nature on the electron attachment process in large molecules.<br>

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