Corrosion behavior of orthodontic wires in artificial saliva with presence of beverage

Author(s):  
A. Christy Catherine Mary ◽  
J. Jeyasundari ◽  
V.R. Nazeera Banu ◽  
R. Dorothy ◽  
Susai Rajendran ◽  
...  
2018 ◽  
Vol 917 ◽  
pp. 197-201
Author(s):  
Aphinan Phukaoluan ◽  
Anak Khantachawana ◽  
Pongpan Kaewtatip ◽  
Surachai Dechkunakorn

The aim of this study, the corrosion behavior of TiNiCu in artificial saliva (pH5.35) at 37°C was assessed by the use of electrochemical methods. Ti50Ni43Cu7 (at%) used in this study were made from ingots prepared by the vacuum arc melting (VAM) method. The furnace was purged with argon gas during melting. All melted ingots were then homogenized at 800°C for 3.6 ks. Open circuit potential (OCP) was monitored at 3.6 ks followed by potentiodynamic techniques. The results showed that all chemical composition of orthodontic wires by EPMA were Ti, Ni, Cu, Cr, Fe and Mn. Surface roughness was measured in order to ensure that TiNiCu and SS was significant difference which might affect corrosion resistance. It was seen that TiNiCu orthodontic wires, presented a good corrosion resistance, compared to the stainless steel, probably due to the formation of a protective oxide film mainly constituted by titanium oxide.


2009 ◽  
Vol 25 (5) ◽  
pp. 672-677 ◽  
Author(s):  
B.B. Zhang ◽  
Y.F. Zheng ◽  
Y. Liu

2011 ◽  
Vol 37 (3) ◽  
pp. 309-317 ◽  
Author(s):  
Eman M Anwar ◽  
Lamia S Kheiralla ◽  
Riham H Tammam

Abstract The effect of fluoride ion concentration on the corrosion behavior of Ti and Ti6Al4V implant alloys, when coupled with either metal/ceramic or all-ceramic superstructure, was examined by different electrochemical methods in artificial saliva solutions. It was concluded that increased fluoride concentration leads to a decrease in the corrosion resistance of all tested couples. The type of the superstructure also showed a significant effect on the corrosion resistance of the couple.


2011 ◽  
Vol 27 (3) ◽  
pp. 214-220 ◽  
Author(s):  
B.B. Zhang ◽  
B.L. Wang ◽  
L. Li ◽  
Y.F. Zheng

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