193 nm Excimer laser processing of Si/Ge/Si(100) micropatterns

2016 ◽  
Vol 362 ◽  
pp. 217-220 ◽  
Author(s):  
F. Gontad ◽  
J.C. Conde ◽  
S. Chiussi ◽  
C. Serra ◽  
P. González
Keyword(s):  
Excimer Laser ◽  
Laser Processing ◽  
193 Nm

Melting threshold of crystalline and amorphized Si irradiated with a pulsed ArF (193 nm) excimer laser

1988 ◽  
Vol 45 (4) ◽  
pp. 361-364 ◽  
Author(s):  
F. Foulon ◽  
E. Fogarassy ◽  
A. Slaoui ◽  
C. Fuchs ◽  
S. Unamuno ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Melting Threshold ◽  
193 Nm

Excimer Laser (193 nm) Myopic Keratomileusis in Sighted and Blind Human Eyes

1990 ◽  
Vol 6 (3) ◽  
pp. 165-173 ◽  
Author(s):  
Theo Seiler ◽  
Gunter Kahle ◽  
Martin Kriegerowski
Keyword(s):  
Excimer Laser ◽  
193 Nm ◽  
Human Eyes

scholarly journals 193-nm deep-UV lithography system using a line-narrowed ArF excimer laser

1993 ◽  
Author(s):  
Bruce W. Smith ◽  
Malcolm C. Gower ◽  
Mark Westcott ◽  
Lynn F. Fuller
Keyword(s):  
Excimer Laser ◽  
Uv Lithography ◽  
Arf Excimer Laser ◽  
Deep Uv ◽  
193 Nm ◽  
Lithography System

Finite element simulation for ultraviolet excimer laser processing of patterned Si/SiGe/Si(100) heterostructures

2010 ◽  
Vol 97 (1) ◽  
pp. 014102 ◽  
Author(s):  
J. C. Conde ◽  
E. Martín ◽  
S. Chiussi ◽  
F. Gontad ◽  
C. Serra ◽  
...  
Keyword(s):  
Finite Element ◽  
Finite Element Simulation ◽  
Excimer Laser ◽  
Laser Processing ◽  
Element Simulation

Excimer Laser Processing of Nodular Iron

1994 ◽  
Vol 9 (3) ◽  
pp. 415-427 ◽  
Author(s):  
A. Fontes ◽  
M. Jeandin ◽  
Olivier Uteza ◽  
Marc Sentis ◽  
Michel Frainais
Keyword(s):  
Excimer Laser ◽  
Laser Processing ◽  
Nodular Iron
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