Effect of oxygen partial pressure on structural and optical properties of pulsed laser deposited CaBi4Ti4O15 thin films

2017 ◽  
Vol 397 ◽  
pp. 49-56 ◽  
Author(s):  
Sivanagi Reddy Emani ◽  
K.C. James Raju
2016 ◽  
Vol 619 ◽  
pp. 86-90 ◽  
Author(s):  
Firdous A. Tantray ◽  
Arpana Agrawal ◽  
Mukul Gupta ◽  
Joseph T. Andrews ◽  
Pratima Sen

2016 ◽  
Vol 755 ◽  
pp. 012053
Author(s):  
Firdous A Tantray ◽  
Romita Chouhan ◽  
Swati Rajput ◽  
Arpana Agrawal ◽  
Joseph T Andrews ◽  
...  

2014 ◽  
Vol 912-914 ◽  
pp. 325-328 ◽  
Author(s):  
Ji Ming Bian ◽  
Li Hua Miao ◽  
Shu Kuo Zhao

VO2films were grown on sapphire substrates by pulsed laser deposition (PLD), and the structural and optical properties of as-grown films were investigated by X-ray diffraction (XRD), field effect scanning electron microscopy (FESEM), photoluminescence (PL), and optical-transmission measurements. The oxygen partial pressure in the growth chamber was found to be the key factor deciding the microstructure and properties of as-deposited VO2films, and its effects and corresponding mechanism were investigated systemically. Results indicated that dense and uniform VO2films with smooth surface were achieved by PLD under optimized oxygen partial pressure. Strong blue emission peaks were observed in room temperature photoluminescence (PL) spectra. Excellent selective optical-transmission of the VO2thin films from 200~3000 nm were also recorded at room temperature.


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