Suppression and characterization of interface states at low-pressure-chemical-vapor-deposited SiN /III-nitride heterostructures

2021 ◽  
Vol 542 ◽  
pp. 148530
Author(s):  
Kexin Deng ◽  
Xinhua Wang ◽  
Sen Huang ◽  
Haibo Yin ◽  
Jie Fan ◽  
...  
Keyword(s):  
Chemical Vapor ◽  
Low Pressure ◽  
Interface States ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical

Characterization of Low Pressure Chemical Vapor Deposited Polysilicon Using Ellipsometry

1996 ◽  
Vol 51-52 ◽  
pp. 179-186 ◽  
Author(s):  
L. Asinovsky ◽  
S. Fox ◽  
E. Karagiannis ◽  
M. Schroth ◽  
J.J. Sweeney
Keyword(s):  
Chemical Vapor ◽  
Low Pressure ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical

Characterization of hydrogenation and dehydrogenation of post‐plasma treated low‐pressure chemical‐vapor‐deposited amorphous silicon films

1987 ◽  
Vol 62 (9) ◽  
pp. 3740-3746 ◽  
Author(s):  
Minoru Nakamura ◽  
Toshiyuki Ohno ◽  
Nobutake Konishi ◽  
Kenji Miyata ◽  
Norimasa Kamezawa
Keyword(s):  
Amorphous Silicon ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Films ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical

scholarly journals Growth and characterization of low pressure chemical vapor deposited Si on Si-face 4H–SiC

2021 ◽  
Vol 131 ◽  
pp. 105888 ◽  
Author(s):  
F. Triendl ◽  
G. Pfusterschmied ◽  
G. Pobegen ◽  
S. Schwarz ◽  
W. Artner ◽  
...  
Keyword(s):  
Chemical Vapor ◽  
Low Pressure ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical

Characterization of low‐pressure chemical‐vapor‐deposited and thermally‐grown silicon nitride films

1982 ◽  
Vol 53 (1) ◽  
pp. 404-415 ◽  
Author(s):  
F. H. P. M. Habraken ◽  
A. E. T. Kuiper ◽  
A. v. Oostrom ◽  
Y. Tamminga ◽  
J. B. Theeten
Keyword(s):  
Silicon Nitride ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Nitride Films ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical ◽  
Thermally Grown
Sign in / Sign up

Export Citation Format

Share Document