Electrical characterization of low‐pressure chemical‐vapor‐deposited silicon dioxide metal‐oxide‐silicon structures

1993 ◽  
Vol 73 (5) ◽  
pp. 2397-2401 ◽  
Author(s):  
S. S. Ang ◽  
Y. J. Shi ◽  
W. D. Brown
Keyword(s):  
Metal Oxide ◽  
Silicon Dioxide ◽  
Electrical Characterization ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical ◽  
Silicon Structures ◽  
Metal Oxide Silicon

Characterization of Low Pressure Chemical Vapor Deposited Polysilicon Using Ellipsometry

1996 ◽  
Vol 51-52 ◽  
pp. 179-186 ◽  
Author(s):  
L. Asinovsky ◽  
S. Fox ◽  
E. Karagiannis ◽  
M. Schroth ◽  
J.J. Sweeney
Keyword(s):  
Chemical Vapor ◽  
Low Pressure ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical

Improving stress stability in low-pressure chemical vapor deposited silicon dioxide films by ion implantation

2016 ◽  
Vol 598 ◽  
pp. 103-108 ◽  
Author(s):  
Haiping Shang ◽  
Jianyu Fu ◽  
Changqing Xie ◽  
Zhigang Li ◽  
Dapeng Chen
Keyword(s):  
Ion Implantation ◽  
Silicon Dioxide ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Dioxide Films ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical

Characterization of hydrogenation and dehydrogenation of post‐plasma treated low‐pressure chemical‐vapor‐deposited amorphous silicon films

1987 ◽  
Vol 62 (9) ◽  
pp. 3740-3746 ◽  
Author(s):  
Minoru Nakamura ◽  
Toshiyuki Ohno ◽  
Nobutake Konishi ◽  
Kenji Miyata ◽  
Norimasa Kamezawa
Keyword(s):  
Amorphous Silicon ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Films ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical
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