Electrical characterization of low‐pressure chemical‐vapor‐deposited silicon dioxide metal‐oxide‐silicon structures

1993 ◽  
Vol 73 (5) ◽  
pp. 2397-2401 ◽  
Author(s):  
S. S. Ang ◽  
Y. J. Shi ◽  
W. D. Brown
Keyword(s):  
Metal Oxide ◽  
Silicon Dioxide ◽  
Electrical Characterization ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical ◽  
Silicon Structures ◽  
Metal Oxide Silicon

X‐ray diffraction study and electrical characterization of boron‐implanted low‐pressure chemical vapor deposited polycrystalline silicon layers

1984 ◽  
Vol 56 (10) ◽  
pp. 2751-2761 ◽  
Author(s):  
M. Hendriks ◽  
R. Delhez ◽  
Th. H. de Keijser ◽  
S. Radelaar ◽  
F. H. P. M. Habraken ◽  
...  
Keyword(s):  
Diffraction Study ◽  
Polycrystalline Silicon ◽  
Electrical Characterization ◽  
Chemical Vapor ◽  
Low Pressure ◽  
X Ray Diffraction ◽  
X Ray ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical

Suppression and characterization of interface states at low-pressure-chemical-vapor-deposited SiN /III-nitride heterostructures

2021 ◽  
Vol 542 ◽  
pp. 148530
Author(s):  
Kexin Deng ◽  
Xinhua Wang ◽  
Sen Huang ◽  
Haibo Yin ◽  
Jie Fan ◽  
...  
Keyword(s):  
Chemical Vapor ◽  
Low Pressure ◽  
Interface States ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical

Characterization of Low Pressure Chemical Vapor Deposited Polysilicon Using Ellipsometry

1996 ◽  
Vol 51-52 ◽  
pp. 179-186 ◽  
Author(s):  
L. Asinovsky ◽  
S. Fox ◽  
E. Karagiannis ◽  
M. Schroth ◽  
J.J. Sweeney
Keyword(s):  
Chemical Vapor ◽  
Low Pressure ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical

Improving stress stability in low-pressure chemical vapor deposited silicon dioxide films by ion implantation

2016 ◽  
Vol 598 ◽  
pp. 103-108 ◽  
Author(s):  
Haiping Shang ◽  
Jianyu Fu ◽  
Changqing Xie ◽  
Zhigang Li ◽  
Dapeng Chen
Keyword(s):  
Ion Implantation ◽  
Silicon Dioxide ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Dioxide Films ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical

Characterization of hydrogenation and dehydrogenation of post‐plasma treated low‐pressure chemical‐vapor‐deposited amorphous silicon films

1987 ◽  
Vol 62 (9) ◽  
pp. 3740-3746 ◽  
Author(s):  
Minoru Nakamura ◽  
Toshiyuki Ohno ◽  
Nobutake Konishi ◽  
Kenji Miyata ◽  
Norimasa Kamezawa
Keyword(s):  
Amorphous Silicon ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Films ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical
Sign in / Sign up

Export Citation Format

Share Document