Extremely Sensitive Mechanochromic Photonic Crystals with Broad Tuning Range of Photonic Bandgap and Fast Responsive Speed for High-Resolution Multicolor Display Applications

2021 ◽  
pp. 132342
Author(s):  
Yang Hu ◽  
Dongpeng Yang ◽  
Dekun Ma ◽  
Shaoming Huang
2009 ◽  
Vol 471 (1-2) ◽  
pp. 241-243 ◽  
Author(s):  
Zhengwen Yang ◽  
Ji Zhou ◽  
Xueguang Huang ◽  
Qin Xie ◽  
Ming Fu ◽  
...  

2006 ◽  
Vol 15 (01) ◽  
pp. 1-8 ◽  
Author(s):  
KAI SONG ◽  
RENAUD VALLEE ◽  
MARK VAN DER AUWERAER ◽  
KOEN CLAYS

The spontaneous emission of fluorophores embedded in a photonic crystal has been studied. By nano-engineering a sandwich-like photonic structure, such that fluorophore-coated photonic atoms constitute a middle layer between the photonic crystals, we have been able to precisely control the location of fluorophores in photonic crystals and exclude the presence of fluorophores at the surface of the crystal. It has been found that the stopband in the transmission spectrum is deeper than the stopband in the emission spectrum. We conjecture that the omnidirectional propagation of the emission from a point source in an incomplete photonic bandgap is the cause of the shallower stopband in emission.


2011 ◽  
Vol 103 (4) ◽  
pp. 897-906 ◽  
Author(s):  
Y. Xiang ◽  
X. Dai ◽  
S. Wen ◽  
Z. Tang ◽  
D. Fan

2006 ◽  
Vol 961 ◽  
Author(s):  
Douglas Resnick ◽  
Gerard Schmid ◽  
Mike Miller ◽  
Gary Doyle ◽  
Chris Jones ◽  
...  

ABSTRACTThe Step and Flash Imprint Lithography (S-FILTM) process uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning for applications where high-resolution mix-and-match overlay is desired. Several applications, including patterned media, photonic crystals and wire grid polarizers, are better served by a patterning process that prints the full wafer since alignment requirements are not so stringent. In this paper, a methodology for creating high resolution thin templates for full wafer (or disk) imprinting is described. The methods have been applied toward the imprinting of both patterned media and photonic crystal devices using a large area printing tool developed around the S-FIL process. Techniques for further enhancing the pattern density as well as a method for addressing feature image placement are described. Finally, a process for replicating a Master Template is discussed in detail.


2000 ◽  
Vol 17 (4) ◽  
pp. 600 ◽  
Author(s):  
Marcel Doosje ◽  
Bernhard J. Hoenders ◽  
Jasper Knoester

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