Surface characteristics and aqueous dispersibility of commercial silicon nitride powders: Effects of acid leaching, surface hydrolysis, and thermal oxidation

2008 ◽  
Vol 34 (8) ◽  
pp. 1835-1842 ◽  
Author(s):  
Jian-Qing Dai ◽  
Yong Huang ◽  
Jing-Tao Ma
Keyword(s):  
Silicon Nitride ◽  
Thermal Oxidation ◽  
Acid Leaching ◽  
Surface Characteristics ◽  
Aqueous Dispersibility ◽  
Leaching Surface

Surface Characteristics and Aqueous Dispersibility of Commercial Silicon Nitride Powders: Comparison of As-Received Powders

2008 ◽  
Vol 368-372 ◽  
pp. 855-857
Author(s):  
Jian Qing Dai ◽  
Yong Huang ◽  
Jing Tao Ma ◽  
Zhi Peng Xie
Keyword(s):  
Silicon Nitride ◽  
Surface Characteristics ◽  
Water Soluble ◽  
Surface Groups ◽  
Production Methods ◽  
Soluble Ions ◽  
Water Soluble Ions ◽  
Powder Properties ◽  
Aqueous Dispersibility

Particular attention is paid in this paper to understanding the surface characteristics and aqueous dispersibility of as-received commercial powders. The different production methods and specific pulverization processes used for the four powders studied (FD1, FD2, M11, UBE) result in obvious differences in such powder properties as surface groups, aqueous dispersibility, and water-soluble ions.

scholarly journals Influence of acid leaching surface treatment on indentation cracking of soda lime silicate glass

2020 ◽  
Vol 543 ◽  
pp. 120144
Author(s):  
Nisha Sheth ◽  
Seung Ho Hahn ◽  
Dien Ngo ◽  
Alexandra Howzen ◽  
Raul Bermejo ◽  
...  
Keyword(s):  
Surface Treatment ◽  
Silicate Glass ◽  
Acid Leaching ◽  
Soda Lime ◽  
Soda Lime Silicate Glass ◽  
Leaching Surface

Thermal Oxidation in Wet Oxygen of Reactive Ion‐Beam Sputter‐Deposited Silicon Nitride Films

1991 ◽  
Vol 138 (4) ◽  
pp. 1084-1089 ◽  
Author(s):  
A. Fourrier ◽  
A. Bosseboeuf ◽  
D. Bouchier ◽  
G. Gautherin
Keyword(s):  
Silicon Nitride ◽  
Thermal Oxidation ◽  
Ion Beam ◽  
Silicon Nitride Films ◽  
Sputter Deposited

Kinetics of Thermal Oxidation of Silicon Nitride Powders

1996 ◽  
Vol 79 (11) ◽  
pp. 2809-2814 ◽  
Author(s):  
Darryl P. Butt ◽  
Diane Albert ◽  
Thomas N. Taylor
Keyword(s):  
Silicon Nitride ◽  
Thermal Oxidation ◽  
Kinetics Of

Minimizing hydrogen content in silicon oxynitride by thermal oxidation of silicon-rich silicon nitride

2006 ◽  
Vol 46 (12) ◽  
pp. 2056-2061 ◽  
Author(s):  
C.K. Wong ◽  
H. Wong ◽  
M. Chan ◽  
C.W. Kok ◽  
H.P. Chan
Keyword(s):  
Silicon Nitride ◽  
Thermal Oxidation ◽  
Hydrogen Content ◽  
Silicon Oxynitride
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