Evolution of microstructure and electrical properties of Aurivillius phase (CaBi4Ti4O15)1-(Bi4Ti3O12) ceramics

2018 ◽  
Vol 44 (8) ◽  
pp. 9168-9173 ◽  
Author(s):  
Bo Wu ◽  
Jian Ma ◽  
Wenjuan Wu ◽  
Min Chen
2008 ◽  
Vol 53 (3) ◽  
pp. 1612-1616 ◽  
Author(s):  
Jin Soo Kim ◽  
Byung Chun Choi ◽  
Jung Hyun Jeong ◽  
Young Woo No ◽  
Su Tae Chung ◽  
...  

2013 ◽  
Vol 854 ◽  
pp. 125-133 ◽  
Author(s):  
Larysa Khomenkova ◽  
Xavier Portier ◽  
Abdelilah Slaoui ◽  
Fabrice Gourbilleau

Hafnium silicate dielectric films were fabricated by radio frequency magnetron sputtering. Their microstructure and electrical properties were studied versus annealing treatment. The evolution of microstructure and the formation of alternated HfO2-rich and SiO2-rich layers were observed and explained by surface directed spinodal decomposition. The stable tetragonal HfO2 phase was formed upon an annealing at 1000-1100°C. The control of annealing temperature allowed the memory window to be achieved and to be tuned as well as the dielectric constant to be enhanced.


2014 ◽  
Vol 40 (4) ◽  
pp. 5765-5769 ◽  
Author(s):  
C.L. Diao ◽  
H.W. Zheng ◽  
Y.Z. Gu ◽  
W.F. Zhang ◽  
L. Fang

2014 ◽  
Vol 585 ◽  
pp. 523-528 ◽  
Author(s):  
V.S. Waman ◽  
M.M. Kamble ◽  
S.S. Ghosh ◽  
A.H. Mayabadi ◽  
B.B. Gabhale ◽  
...  

2009 ◽  
Vol 106 (4) ◽  
pp. 044106 ◽  
Author(s):  
Hongtao Zhang ◽  
Haixue Yan ◽  
Michael J. Reece

2009 ◽  
Vol 54 (9(2)) ◽  
pp. 906-910 ◽  
Author(s):  
JinSoo Kim ◽  
YuSung Kim ◽  
ByungChun Choi ◽  
JungHyun Jeong ◽  
SuTae Chung ◽  
...  

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