Growth and characterization of chemical vapor deposition diamond coating incorporated amorphous carbon with high Raman bands induced by CuO particles

2021 ◽  
Vol 116 ◽  
pp. 108387
Author(s):  
Naichao Chen ◽  
Fasong Ju ◽  
Fan Zhou ◽  
Shuai Chen ◽  
Kun Wei ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Diamond ◽  
Diamond Coating

Lateral micro-ion beam induced charge characterization of chemical vapor deposition diamond

2002 ◽  
Vol 90 (1-2) ◽  
pp. 191-195
Author(s):  
Lu Rongrong ◽  
C. Manfredotti ◽  
F. Fizzotti ◽  
E. Vittone ◽  
A. Logiudice
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Diamond ◽  
Induced Charge

Characterization of chemical bonding and physical characteristics of diamond-like amorphous carbon and diamond films

1992 ◽  
Vol 7 (2) ◽  
pp. 404-410 ◽  
Author(s):  
Bharat Bhushan ◽  
Andrew J. Kellock ◽  
Nam-Hee Cho ◽  
Joel W. Ager
Keyword(s):  
Chemical Vapor Deposition ◽  
Physical Properties ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Bulk Diamond

Diamond-like (amorphous) carbon (DLC) films were prepared by dc magnetron sputtering and plasma enhanced chemical vapor deposition (PECVD) and diamond films were prepared by microwave plasma enhanced chemical vapor deposition (MPECVD). For the first time, chemical and mechanical characterization of the films from each category are carried out systematically and a comparison of the chemical and physical properties is provided. We find that DLC coatings produced by PECVD are superior in microhardness and modulus of elasticity to those produced by sputtering. PECVD films contain a larger fraction of sp3-bonding than the sputtered hydrogenated carbon films. Chemical and physical properties of the diamond films appear to be close to those of bulk diamond.

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