Electrochemical Enhancement of Reactively Sputtered Rhodium, Ruthenium, and Iridium Oxide Thin Films for Neural Modulation, Sensing, and Recording Applications

2021 ◽  
pp. 139118
Author(s):  
Gregory Taylor ◽  
Rhandy Paladines ◽  
Anthony Marti ◽  
Daaron Jacobs ◽  
Saxon Tint ◽  
...  
Keyword(s):  
Thin Films ◽  
Iridium Oxide ◽  
Oxide Thin Films ◽  
Neural Modulation

Pulsed laser deposition of highly conductive iridium oxide thin films

1996 ◽  
Vol 69 (14) ◽  
pp. 2027-2029 ◽  
Author(s):  
M. A. El Khakani ◽  
M. Chaker ◽  
E. Gat
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Iridium Oxide ◽  
Laser Deposition ◽  
Oxide Thin Films

scholarly journals Analysis of Mesoporous Iridium Oxide Thin Films by the Combined Methodical Approach SEM/EDS/STRATAGem

2018 ◽  
Vol 24 (S1) ◽  
pp. 762-763 ◽  
Author(s):  
Rene Sachsé ◽  
Andreas Hertwig ◽  
Ralph Kraehnert ◽  
Vasile-Dan Hodoroaba
Keyword(s):  
Thin Films ◽  
Iridium Oxide ◽  
Oxide Thin Films ◽  
Methodical Approach

scholarly journals Electrochromic Properties of Sputtered Iridium Oxide Thin Films with Various Film Thicknesses

2016 ◽  
Vol 6 (1) ◽  
pp. 44 ◽  
Author(s):  
Yoshio Abe ◽  
Satoshi Ito ◽  
Kyung Ho Kim ◽  
Midori Kawamura ◽  
Takayuki Kiba
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Color Change ◽  
Response Times ◽  
Response Speed ◽  
Iridium Oxide ◽  
Oxide Thin Films ◽  
Electrochromic Material ◽  
Transmittance Change ◽  
Almost All

Iridium oxide is an anodic electrochromic material, which takes on a blue-black color through electrochemical oxidation and turns to transparent via reduction. Hydrated amorphous Ir oxide thin films with various thicknesses from 20 to 400 nm were prepared by reactive sputtering in a H2O atmosphere, and their transmittance spectra in both the bleached and colored states as well as their response times were examined in this study. The bleached and colored transmittances decreased with increasing film thickness according to Lambert’s law, and the absorption coefficients in the bleached and colored states were estimated to be 3.2 ´ 103 and 1.1 ´ 105 cm-1, respectively, at a wavelength of 600 nm. The results point to almost all the Ir atoms being electrochemically active and contributing to the color change. A maximum transmittance change of 81% was obtained for the 400 nm-thick film. Further, there was a trade-off between the response speed and the transmittance change. The response speed slowed down with increasing the film thickness, while the coloring and bleaching response time for the thick films was several tens of seconds.

Effect of film thickness on electrochromic activity of spray deposited iridium oxide thin films

2006 ◽  
Vol 99 (2-3) ◽  
pp. 309-313 ◽  
Author(s):  
P.S. Patil ◽  
S.H. Mujawar ◽  
S.B. Sadale ◽  
H.P. Deshmukh ◽  
A.I. Inamdar
Keyword(s):  
Thin Films ◽  
Film Thickness ◽  
Iridium Oxide ◽  
Oxide Thin Films

Stability and chemical composition of thermally grown iridium-oxide thin films

2000 ◽  
Vol 18 (4) ◽  
pp. 1919 ◽  
Author(s):  
Babu R. Chalamala ◽  
Yi Wei ◽  
Robert H. Reuss ◽  
Sanjeev Aggarwal ◽  
Scott R. Perusse ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Composition ◽  
Iridium Oxide ◽  
Oxide Thin Films ◽  
Thermally Grown

Iridium metal and iridium oxide thin films grown by atomic layer deposition at low temperatures

2011 ◽  
Vol 21 (41) ◽  
pp. 16488 ◽  
Author(s):  
Jani Hämäläinen ◽  
Timo Hatanpää ◽  
Esa Puukilainen ◽  
Timo Sajavaara ◽  
Mikko Ritala ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Low Temperatures ◽  
Atomic Layer ◽  
Iridium Oxide ◽  
Oxide Thin Films ◽  
Layer Deposition

Phase control of iridium and iridium oxide thin films in atomic layer deposition

2008 ◽  
Vol 103 (2) ◽  
pp. 023517 ◽  
Author(s):  
Sung-Wook Kim ◽  
Se-Hun Kwon ◽  
Dong-Kee Kwak ◽  
Sang-Won Kang
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Phase Control ◽  
Iridium Oxide ◽  
Oxide Thin Films ◽  
Layer Deposition

Substrate temperature dependent morphology and resistivity of pulsed laser deposited iridium oxide thin films

2006 ◽  
Vol 496 (2) ◽  
pp. 371-375 ◽  
Author(s):  
L.M. Zhang ◽  
Y.S. Gong ◽  
C.B. Wang ◽  
Q. Shen ◽  
M.X. Xia
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Pulsed Laser ◽  
Iridium Oxide ◽  
Oxide Thin Films ◽  
Temperature Dependent
Sign in / Sign up

Export Citation Format

Share Document