scholarly journals Physical Mechanism of Field Modulation Effects in Ion Implanted Edge Termination of Vertical GaN Schottky Barrier Diodes

Author(s):  
Ruiyuan Yin ◽  
Chiachia Li ◽  
Bin Zhang ◽  
Jinyan Wang ◽  
Yunyi Fu ◽  
...  
2021 ◽  
pp. 1-1
Author(s):  
Qiming He ◽  
Weibing Hao ◽  
Xuanze Zhou ◽  
Yu Li ◽  
Kai Zhou ◽  
...  

1980 ◽  
Vol 27 (2) ◽  
pp. 420-425 ◽  
Author(s):  
J.B. Bindell ◽  
W.M. Moller ◽  
E.F. Labuda

1999 ◽  
Vol 572 ◽  
Author(s):  
Q. Zhang ◽  
V. Madangarli ◽  
S. Soloviev ◽  
T. S. Sudarshan

ABSTRACTP-type 6H SiC Schottky barrier diodes with good rectifying characteristics upto breakdown voltage as high as 1000V have been successfully fabricated using metal-overlap over a thick oxide layer (∼ 6000 Å) as edge termination and Al as the barrier metal. The influence of the oxide layer edge termination in improving the reverse breakdown voltage as well as the forward current – voltage characteristics is presented. The terminated Schottky diodes indicate a factor of two higher breakdown voltage and 2–3 times larger forward current densities than those without edge termination. The specific series resistance of the unterminated diodes was ∼228 mΩ-cm2, while that of the terminated diodes was ∼84 mΩ-cm2.


2013 ◽  
Vol 30 (5) ◽  
pp. 057303 ◽  
Author(s):  
Wei-Zong Xu ◽  
Li-Hua Fu ◽  
Hai Lu ◽  
Fang-Fang Ren ◽  
Dun-Jun Chen ◽  
...  

2005 ◽  
Vol 44 (No. 40) ◽  
pp. L1244-L1247 ◽  
Author(s):  
Bor Wen Liou ◽  
Tron Min Chen ◽  
Chih Wei Chen ◽  
Kai Ming Uang ◽  
Shui Jinn Wang

2008 ◽  
Vol 17 (4-5) ◽  
pp. 809-812 ◽  
Author(s):  
K. Ikeda ◽  
H. Umezawa ◽  
S. Shikata

2018 ◽  
Vol 65 (5) ◽  
pp. 1765-1770 ◽  
Author(s):  
Eliana Acurio ◽  
Felice Crupi ◽  
Nicolo Ronchi ◽  
Brice De Jaeger ◽  
Benoit Bakeroot ◽  
...  

2005 ◽  
Vol 483-485 ◽  
pp. 941-944 ◽  
Author(s):  
M. Furno ◽  
F. Bonani ◽  
G. Ghione ◽  
Sergio Ferrero ◽  
Samuele Porro ◽  
...  

We present a theoretical and experimental study on the design, fabrication and characterization of Schottky Barrier Diodes (SBD) on commercial 4H-SiC epitaxial layers. Numerical simulations were performed with a commercial tool on different edge termination structures, with the aim of optimizing the device behavior. For each termination design, SBD were fabricated and characterized by means of electrical measurements vs. temperature. Simulations provided also useful data for the assessment of the device process technology.


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