Corrigendum to “Hydrogen storage property of MgH2 synthesized by hydriding chemical vapor deposition” [J. Alloys Compd. 446–447 (2007) 80–83]

2009 ◽  
Vol 482 (1-2) ◽  
pp. 556 ◽  
Author(s):  
I. Saita ◽  
T. Toshima ◽  
S. Tanda ◽  
T. Akiyama
2006 ◽  
Vol 971 ◽  
Author(s):  
Itoko Saita ◽  
Tomohiro Akiyama

ABSTRACTIt is hardly achieved to prepare highly pure MgH2 by the conventional method of solid-gas reaction between solid magnesium and hydrogen; therefore, we proposed and succeeded to synthesize MgH2 by Hydriding Chemical Vapor Deposition (HCVD). Very interestingly, the HCVDed MgH2 was made of single crystals with fibrous figures; however, further detail of the HCVDed product had not been studied. Therefore the aim of this study was to examine the HCVDed MgH2 in hydrogen storage and to observe the microstructure of the HCVDed MgH2 after the hydrogen desorption and absorption.As the results of Pressure-Composition-Isotherm (PCT) measurement, the HCVDed MgH2 reversibly absorbed and desorbed 7.6 mass% hydrogen, as much as the theoretical maximum hydrogen capacity of magnesium, without any activation treatment. The equilibrium pressure was slightly lower than the reported value. Before and after the PCT measurement, the HCVDed MgH2 did not showed noticeable difference in figure; however, MgHx, which was prepared dehydriding the HCVDed MgH2 in the PCT, showed significant difference in figure: It had zebra stripes in the SEM observation. This observation showed that the hydrogen storage and release went in the radious direction and the hydrogen diffusion was no more rate-limiting. The phase boundaries of Mg and MgH2 involving strain should affected on the plateau pressure in PCT.


2004 ◽  
Vol 108 (34) ◽  
pp. 12718-12723 ◽  
Author(s):  
Revathi Bacsa ◽  
Christophe Laurent ◽  
Ryuta Morishima ◽  
Hiroshi Suzuki ◽  
Mikako Le Lay

Author(s):  
J. Drucker ◽  
R. Sharma ◽  
J. Kouvetakis ◽  
K.H.J. Weiss

Patterning of metals is a key element in the fabrication of integrated microelectronics. For circuit repair and engineering changes constructive lithography, writing techniques, based on electron, ion or photon beam-induced decomposition of precursor molecule and its deposition on top of a structure have gained wide acceptance Recently, scanning probe techniques have been used for line drawing and wire growth of W on a silicon substrate for quantum effect devices. The kinetics of electron beam induced W deposition from WF6 gas has been studied by adsorbing the gas on SiO2 surface and measuring the growth in a TEM for various exposure times. Our environmental cell allows us to control not only electron exposure time but also the gas pressure flow and the temperature. We have studied the growth kinetics of Au Chemical vapor deposition (CVD), in situ, at different temperatures with/without the electron beam on highly clean Si surfaces in an environmental cell fitted inside a TEM column.


Sign in / Sign up

Export Citation Format

Share Document