Structural characteristics and resistive switching properties of thermally prepared TiO2 thin films

2009 ◽  
Vol 486 (1-2) ◽  
pp. 458-461 ◽  
Author(s):  
Xun Cao ◽  
Xiaomin Li ◽  
Weidong Yu ◽  
Yiwen Zhang ◽  
Rui Yang ◽  
...  
2007 ◽  
Vol 91 (1) ◽  
pp. 012907 ◽  
Author(s):  
Kyung Min Kim ◽  
Byung Joon Choi ◽  
Yong Cheol Shin ◽  
Seol Choi ◽  
Cheol Seong Hwang

Cerâmica ◽  
2002 ◽  
Vol 48 (305) ◽  
pp. 38-42 ◽  
Author(s):  
M. I. B. Bernardi ◽  
E. J. H. Lee ◽  
P. N. Lisboa-Filho ◽  
E. R. Leite ◽  
E. Longo ◽  
...  

The synthesis of TiO2 thin films was carried out by the Organometallic Chemical Vapor Deposition (MOCVD) method. The influence of deposition parameters used during growth on the final structural characteristics was studied. A combination of the following experimental parameters was studied: temperature of the organometallic bath, deposition time, and temperature and substrate type. The high influence of those parameters on the final thin film microstructure was analyzed by scanning electron microscopy with electron dispersive X-ray spectroscopy, atomic force microscopy and X-ray diffraction.


ACS Omega ◽  
2020 ◽  
Vol 5 (30) ◽  
pp. 19050-19060
Author(s):  
Misbah Sehar Abbasi ◽  
Muhammad Sultan Irshad ◽  
Naila Arshad ◽  
Iftikhar Ahmed ◽  
Muhammad Idrees ◽  
...  

2010 ◽  
Vol 10 (1) ◽  
pp. e71-e74 ◽  
Author(s):  
Young Ho Do ◽  
June Sik Kwak ◽  
Yoon Cheol Bae ◽  
Jong Hyun Lee ◽  
Yongmin Kim ◽  
...  

2013 ◽  
Vol 529 ◽  
pp. 430-434 ◽  
Author(s):  
Chun-Hung Lai ◽  
Chih-Yi Liu ◽  
Cheng-Hsing Hsu ◽  
Yi-Mu Lee ◽  
Jenn-Sen Lin ◽  
...  

2010 ◽  
Vol 97 (23) ◽  
pp. 232904 ◽  
Author(s):  
Jung Ho Yoon ◽  
Kyung Min Kim ◽  
Min Hwan Lee ◽  
Seong Keun Kim ◽  
Gun Hwan Kim ◽  
...  

2010 ◽  
Vol 4 (5-6) ◽  
pp. 112-114 ◽  
Author(s):  
Yong Cheol Shin ◽  
Min Hwan Lee ◽  
Kyung Min Kim ◽  
Gun Hwan Kim ◽  
Seul Ji Song ◽  
...  

2006 ◽  
Vol 89 (8) ◽  
pp. 082909 ◽  
Author(s):  
Doo Seok Jeong ◽  
Herbert Schroeder ◽  
Rainer Waser

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