Substrate temperature optimization of pulsed-laser-deposited and in-situ Zn-supplemented-CZTS films and their integration into photovoltaic devices

2021 ◽  
pp. 162292
Author(s):  
Z.O. Elhmaidi ◽  
E. Saucedo ◽  
M Abd-Lefdil ◽  
M.A. El Khakani
Keyword(s):  
Substrate Temperature ◽  
Pulsed Laser ◽  
Photovoltaic Devices ◽  
Temperature Optimization

In vacuo Pulsed Laser Ablation of YBa2Cu3O7–x Target for the Formation of Y2O3 Nanostructures

2002 ◽  
Vol 17 (3) ◽  
pp. 697-700 ◽  
Author(s):  
D. B. Jan ◽  
Q. X. Jia ◽  
M. E. Hawley ◽  
G. W. Browne ◽  
C. J. Wetteland ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Three Dimensional ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Laser Deposition ◽  
Growth Surface ◽  
Planar Growth

The formation of superconducting YBa2Cu3O7–x (Y123) by in situ pulsed laser deposition from a stoichiometric Y123 target typically requires an oxygen-ambient environment (P ˜ 100–300-mtorr O2) and appropriate substrate temperature during deposition. We have found that pulsed laser deposition from a Y123 target in vacuo onto a (001) LaAlO3 substrate favors the formation of Y2O3. We observed that the Y2O3 (001) films yield three-dimensional nanoscale morphologies that are markedly different from the planar growth surface of conventional superconducting c-axis Y123 films and Y2O3 films formed from the pulsed laser ablation of a Y2O3 target.

In-Situ Optical Diagnostics During Pulsed-Laser Deposition of Magnetoresistive La-Ca-Mn-O Films on Silicon Substrates

1996 ◽  
Vol 441 ◽  
Author(s):  
P.-J. Kung ◽  
J. E. Cosgrove ◽  
K. Kinsella ◽  
D. G. Hamblen
Keyword(s):  
Film Thickness ◽  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Target Surface ◽  
Laser Deposition ◽  
Silicon Substrates ◽  
Ft Ir

AbstractDuring pulsed-laser deposition of La0.67Ca0.33MnO3 films on silicon substrates, a system that consists of visible optical-emission spectroscopy (OES) and Fourier transform infrared (FT-IR) spectroscopy is employed to perform in-situ diagnosis of the laser-induced plume and to monitor the substrate temperature and the film thickness. The effects of oxygen pressure, laser fluence, and distance from the target surface on emission spectra were studied. In FT-IR measurements, the slopes of the reflectance versus wavenumber curves were observed to increase with film thickness and hence with time, which provides end-point detection during the film growth. La0.67Ca0.33MnO3 films with (100), (110), and mixed orientations, depending on the substrate temperature, were deposited on yttria-stabilized zirconia (YSZ) buffered Si(100) and Si(111) substrates. In a magnetic field of 5 T, the maximum magnetoresistance (MR) values of 250% at 195 K and 164% at 140 K were observed in the as-deposited (110) and (100) films, respectively.

In-situ temperature and thickness control grown 2D-MoS2 via pulsed laser ablation for photovoltaic devices

Solar Energy ◽  
2018 ◽  
Vol 174 ◽  
pp. 286-295 ◽  
Author(s):  
Arunachalam Arulraj ◽  
Mohan Ramesh ◽  
Balasubramanian Subramanian ◽  
Govindan Senguttuvan
Keyword(s):  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Photovoltaic Devices ◽  
Thickness Control

In situ deposition of ErNi2B2C films by pulsed laser ablation technique

1998 ◽  
Vol 299 (1-2) ◽  
pp. 15-22 ◽  
Author(s):  
A Canesi ◽  
M.R Cimberle ◽  
C Ferdeghini ◽  
A Diaspro ◽  
P Guasconi ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Ablation Technique ◽  
In Situ Deposition ◽  
Laser Ablation Technique
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