Structure and thermal stability of InAs/GaAs quantum dots grown by atomic layer epitaxy and molecular beam epitaxy

2005 ◽  
Vol 285 (1-2) ◽  
pp. 137-145 ◽  
Author(s):  
Hyung Seok Kim ◽  
Ju Hyung Suh ◽  
Chan Gyung Park ◽  
Sang Jun Lee ◽  
Sam Kyu Noh ◽  
...  
2004 ◽  
Vol 839 ◽  
Author(s):  
H. S. Kim ◽  
J. H. Suh ◽  
C. G. Park ◽  
S. J. Lee ◽  
S. K. Noh ◽  
...  

ABSTRACTSelf-assembled InAs/GaAs quantum dots (QDs) were grown by the atomic layer epitaxy technique and the structure and the thermal stability of QDs have been studied by using high resolution electron microscopy with in-situ heating experiment capability. The QDs were found to form a hemispherical structure with {136} side facet in the early stage of growth. The average height and diameter of the QD were found to be ∼ 5.5 nm and ∼ 23 nm, respectively. Upon capping by GaAs layer, however, the apex structure of QD changed to a flat one. In-situ heating experiment within TEM revealed that the uncapped QD remained stable until 580°C. However, at temperature above 600°C, the QD structure became flat due to the fast decrease of QD height. After flattening, the atoms diffused from the InAs QD to the GaAs substrate, resulting in the total collapse. The density of the QD decreased abruptly by this collapse and most QDs disappeared at above 600°C.


2004 ◽  
Vol 269 (2-4) ◽  
pp. 181-186 ◽  
Author(s):  
G.X. Shi ◽  
P. Jin ◽  
B. Xu ◽  
C.M. Li ◽  
C.X. Cui ◽  
...  

2002 ◽  
Vol 299 (1) ◽  
pp. 79-84 ◽  
Author(s):  
M Xu ◽  
C.X Liu ◽  
H.F Liu ◽  
G.M Luo ◽  
X.M Chen ◽  
...  

2006 ◽  
Vol 527-529 ◽  
pp. 1559-1562
Author(s):  
Jörg Pezoldt ◽  
Thomas Kups ◽  
Petia Weih ◽  
Thomas Stauden ◽  
Oliver Ambacher

3C-(Si1-xC1-y)Gex+y ternary alloys were grown on 8.5° off axis 4H-SiC substrates by solid source molecular beam epitaxy in a temperature range between 750°C and 950°C. Energy dispersive X-ray (EDX) analysis revealed a decrease of the Ge incorporation versus substrate temperature. This effect is due to the fixed Si/Ge ratio during the epitaxial growth. The Ge distribution within the grown epitaxial layers was found to be nearly homogeneous. The investigations by atomic location by channeling enhanced microanalysis allowed the conclusion that Ge is located mainly at Si lattice sites.


Langmuir ◽  
2016 ◽  
Vol 32 (11) ◽  
pp. 2601-2607 ◽  
Author(s):  
M. Sky Driver ◽  
John D. Beatty ◽  
Opeyemi Olanipekun ◽  
Kimberly Reid ◽  
Ashutosh Rath ◽  
...  

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