The epitaxial growth of the LaCaMnO thin films with the CMR effects prepared by a new method: Precursor film sintering

ABSTRACTA new method for the growth of epitaxial compound thin films, termed allotaxy, is proposed and the fabrication of the silicide heterostructure Si/CoSi2/Si(100) Is demonstrated. Allotaxy is a two. step process. In our example, Si is deposited on a heated Si substrate and then Co is coevaporated at varying rates such that a peaked Co-depth profile in Si is generated. At appropriate deposition conditions CoSi2 precipitates embedded in single crystalline Si are formed. These precipitates coarsen and coalesce into a buried, uniform, epitaxial CoSi2 layer during the second processing step, a high temperature anneal. Allotaxy should allow not only the epitaxial growth of silicides but also that of other binary, precipitates forming systems.

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Epitaxial Growth of Sr0.3Ba0.7Nb2O6 Thin Films Prepared by Sol-Gel Process

MRS Proceedings ◽

10.1557/proc-606-181 ◽

1999 ◽

Vol 606 ◽

Cited By ~ 2

Author(s):

Keishi Nishio ◽

Jirawat Thongrueng ◽

Yuichi Watanabe ◽

Toshio Tsuchiya

Keyword(s):

Thin Film ◽

Thin Films ◽

Epitaxial Growth ◽

Raw Materials ◽

Substrate Surface ◽

Sol Gel ◽

Tungsten Bronze ◽

Monomethyl Ether ◽

Tetragonal Tungsten Bronze ◽

Sol Gel Process

AbstructWe succeeded in the preparation of strontium-barium niobate (Sr0.3Ba0.7Nb2O6 : SBN30)that have a tetragonal tungsten bronze type structure thin films on SrTiO3 (100), STO, or La doped SrTiO3 (100), LSTO, single crystal substrates by a spin coating process. LSTO substrate can be used for electrode. A homogeneous coating solution was prepared with Sr and Ba acetates and Nb(OEt)5 as raw materials, and acetic acid and diethylene glycol monomethyl ether as solvents. The coating thin films were sintered at temperature from 700 to 1000°C for 10 min in air. It was confirmed that the thin films on STO substrate sintered above 700°C were in the epitaxial growth because the 16 diffraction spots were observed on the pole figure using (121) reflection. The <130> and <310> direction of the thin film on STO were oriented with the c-axis in parallel to the substrate surface. However, the diffraction spots of thin film on LSTO substrate sintered at 700°C were corresponds to the expected pattern for (110).

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Epitaxial growth and characterization of Cu thin films deposited on Al2O3(0001) substrates by magnetron sputtering

Materials Letters ◽

10.1016/j.matlet.2021.130119 ◽

2021 ◽

pp. 130119

Author(s):

Ik-Jae Lee ◽

Hee Seob Kim ◽

Young Duck Yun ◽

Seen-Woong Kang ◽

Hyo-Yun Kim ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Epitaxial Growth

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Deep-Ultraviolet Transparent Conductive MWCNT/SiO2 Composite Thin Film Fabricated by UV Irradiation at Ambient Temperature onto Spin-Coated Molecular Precursor Film

Nanomaterials ◽

10.3390/nano11051348 ◽

2021 ◽

Vol 11 (5) ◽

pp. 1348

Author(s):

Hiroki Nagai ◽

Naoki Ogawa ◽

Mitsunobu Sato

Keyword(s):

Thin Film ◽

Thin Films ◽

Heat Treatment ◽

Uv Irradiation ◽

Composite Thin Film ◽

Precursor Film ◽

Mixed Solution ◽

Pencil Hardness ◽

Strong Base ◽

Deep Ultraviolet

Deep-ultraviolet (DUV) light-transparent conductive composite thin films, consisting of dispersed multiwalled carbon nanotubes (MWCNTs) and SiO2 matrix composites, were fabricated on a quartz glass substrate. Transparent and well-adhered amorphous thin films, with a thickness of 220 nm, were obtained by weak ultraviolet (UV) irradiation (4 mW cm−2 at 254 nm) for more than 6 h at 20−40 °C onto the precursor films, which were obtained by spin coating with a mixed solution of MWCNT in water and Si(IV) complex in ethanol. The electrical resistivity of MWCNT/SiO2 composite thin film is 0.7 Ω·cm, and transmittance in the wavelength region from DUV to visible light is higher than 80%. The MWCNT/SiO2 composite thin film showed scratch resistance at pencil hardness of 8H. Importantly, the resistivity of the MWCNT/SiO2 composite thin film was maintained at the original level even after heat treatment at 500 °C for 1 h. It was observed that the heat treatment of the composite thin film improved durability against both aqueous solutions involving a strong acid (HCl) and a strong base (NaOH).

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