In-situ growth of high-performance (Ag, Sn) co-doped CoSb3 thermoelectric thin films

2021 ◽  
Author(s):  
Zhuang-Hao Zheng ◽  
Jun-Yun Niu ◽  
Dong-Wei Ao ◽  
Bushra Jabar ◽  
Xiao-Lei Shi ◽  
...  
Keyword(s):  
Thin Films ◽  
High Performance ◽  
In Situ Growth ◽  
Thermoelectric Thin Films ◽  
Co Doped

In Situ Growth of Metal–Organic Framework Thin Films with Gas Sensing and Molecule Storage Properties

Langmuir ◽  
2013 ◽  
Vol 29 (27) ◽  
pp. 8657-8664 ◽  
Author(s):  
Wei-Jin Li ◽  
Shui-Ying Gao ◽  
Tian-Fu Liu ◽  
Li-Wei Han ◽  
Zu-Jin Lin ◽  
...  
Keyword(s):  
Thin Films ◽  
Gas Sensing ◽  
Metal Organic Framework ◽  
In Situ Growth ◽  
Metal Organic ◽  
Storage Properties ◽  
Organic Framework

Interfacial adhesion of nanoporous zeolite thin films

2006 ◽  
Vol 21 (2) ◽  
pp. 505-511 ◽  
Author(s):  
Lili Hu ◽  
Junlan Wang ◽  
Zijian Li ◽  
Shuang Li ◽  
Yushan Yan
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Interfacial Adhesion ◽  
Interfacial Strength ◽  
Future Generation ◽  
In Situ Growth ◽  
Seeded Growth ◽  
Si Substrates ◽  
Film Substrate

Nanoporous silica zeolite thin films are promising candidates for future generation low-dielectric constant (low-k) materials. During the integration with metal interconnects, residual stresses resulting from the packaging processes may cause the low-k thin films to fracture or delaminate from the substrates. To achieve high-quality low-k zeolite thin films, it is important to carefully evaluate their adhesion performance. In this paper, a previously reported laser spallation technique is modified to investigate the interfacial adhesion of zeolite thin film-Si substrate interfaces fabricated using three different methods: spin-on, seeded growth, and in situ growth. The experimental results reported here show that seeded growth generates films with the highest measured adhesion strength (801 ± 68 MPa), followed by the in situ growth (324 ± 17 MPa), then by the spin-on (111 ± 29 MPa). The influence of the deposition method on film–substrate adhesion is discussed. This is the first time that the interfacial strength of zeolite thin films-Si substrates has been quantitatively evaluated. This paper is of great significance for the future applications of low-k zeolite thin film materials.

In situ growth of ultrathin Ni–Fe LDH nanosheets for high performance oxygen evolution reaction

2017 ◽  
Vol 4 (7) ◽  
pp. 1173-1181 ◽  
Author(s):  
Haidong Yang ◽  
Sha Luo ◽  
Yun Bao ◽  
Yutong Luo ◽  
Jun Jin ◽  
...  
Keyword(s):  
Oxygen Evolution ◽  
Oxygen Evolution Reaction ◽  
High Performance ◽  
Copper Foil ◽  
Catalytic Performance ◽  
In Situ Growth ◽  
Ultrathin Nanosheet

The ultrathin Ni70Fe30LDH nanosheets were successfullyin situgrown on anodic polarized copper foil, denoted as u-Ni70Fe30LDHs/a-CF. Benefiting from the ultrathin nanosheet structure, the catalyst exhibits remarkable catalytic performance for OER in 1 M KOH solution.

In situ growth of Co3O4 nanoparticles on α-MnO2 nanotubes: a new hybrid for high-performance supercapacitors

2014 ◽  
Vol 2 (22) ◽  
pp. 8465-8471 ◽  
Author(s):  
Dongbo Yu ◽  
Jianfeng Yao ◽  
Ling Qiu ◽  
Yufei Wang ◽  
Xinyi Zhang ◽  
...  
Keyword(s):  
High Performance ◽  
Physical Mixture ◽  
Co3o4 Nanoparticles ◽  
In Situ Growth

A new MnO2@Co3O4 hybrid with small-sized Co3O4 nanoparticles grown on α-MnO2 nanotubes exhibited much improved capacitive performances than those of pristine α-MnO2 nanotubes and a physical mixture of α-MnO2 nanotubes and Co3O4 nanoparticles.

Combinatorial in situ Growth-and-Analysis with Synchrotron Radiation of Thin Films for Oxide Electronics

2007 ◽  
Author(s):  
M. Oshima ◽  
H. Kumigashira ◽  
K. Horiba ◽  
T. Ohnishi ◽  
M. Lippmaa ◽  
...  
Keyword(s):  
Thin Films ◽  
Synchrotron Radiation ◽  
In Situ Growth ◽  
Oxide Electronics

In Situ Growth and Electrochemical Activation of Copper-Based Nickel–Cobalt Hydroxide for High-Performance Energy Storage Devices

2021 ◽  
Vol 4 (9) ◽  
pp. 9460-9469
Author(s):  
Guichao Liu ◽  
Xue-Zhi Song ◽  
Yuechi Hao ◽  
Zhifang Feng ◽  
Ruiyuan Hu ◽  
...  
Keyword(s):  
Energy Storage ◽  
High Performance ◽  
Cobalt Hydroxide ◽  
Electrochemical Activation ◽  
In Situ Growth ◽  
Energy Storage Devices ◽  
Storage Devices ◽  
Nickel Cobalt

A Uhv Tem Study of the in Situ Growth of Ultra-Thin Films of CoSi2 ON Si (100).

1988 ◽  
Vol 138 ◽  
Author(s):  
D. Loretto ◽  
J. M. Gibson ◽  
S. M. Yalisove
Keyword(s):  
Thin Films ◽  
In Situ Growth

In Situ Growth of Sn-Doped Ni3S2Nanosheets on Ni Foam as High-Performance Electrocatalyst for Hydrogen Evolution Reaction

2017 ◽  
Vol 4 (3) ◽  
pp. 594-600 ◽  
Author(s):  
Jing Yu ◽  
Fei-Xiang Ma ◽  
Yue Du ◽  
Pan-Pan Wang ◽  
Cheng-Yan Xu ◽  
...  
Keyword(s):  
Hydrogen Evolution ◽  
Hydrogen Evolution Reaction ◽  
High Performance ◽  
In Situ Growth ◽  
Ni Foam
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