High quality SiO2 gate insulator suitable for poly-Si TFTs on plastic substrates employing inductively coupled plasma-chemical vapor deposition with N2O plasma treatment and excimer laser annealing

Journal of Non-Crystalline Solids ◽

10.1016/j.jnoncrysol.2005.11.082 ◽

2006 ◽

Vol 352 (9-20) ◽

pp. 1434-1437 ◽

Author(s):

Sang-Myeon Han ◽

Moon-Young Shin ◽

Joong-Hyun Park ◽

Min-Koo Han

Keyword(s):

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Laser Annealing ◽

Chemical Vapor ◽

Gate Insulator ◽

Plasma Chemical ◽

Excimer Laser Annealing ◽

Plastic Substrates ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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High voltage AlGaN/GaN Schottky barrier diode employing the inductively coupled plasma-chemical vapor deposition SiO2 passivation

2007 7th Internatonal Conference on Power Electronics ◽

10.1109/icpe.2007.4692351 ◽

2007 ◽

Author(s):

Young-Hwan Choi ◽

Jiyong Lim ◽

Kyu-Heon Cho ◽

Min-Koo Han

Keyword(s):

Chemical Vapor Deposition ◽

Schottky Barrier ◽

High Voltage ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Schottky Barrier Diode ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Low Temperature Silicon Nitride and Silicon Dioxide Film Processing by Inductively Coupled Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1393382 ◽

2000 ◽

Vol 147 (4) ◽

pp. 1481 ◽

Author(s):

J. W. Lee ◽

K. D. Mackenzie ◽

D. Johnson ◽

J. N. Sasserath ◽

S. J. Pearton ◽

...

Keyword(s):

Silicon Nitride ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Silicon Dioxide Film ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

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Electron Field Emission from a-C:F:N Film Deposited by Inductively Coupled Plasma Chemical Vapor Deposition

SID Symposium Digest of Technical Papers ◽

10.1889/1.1833829 ◽

1998 ◽

Vol 29 (1) ◽

pp. 601

Author(s):

Suk Jae Chung ◽

Eun Jung Han ◽

Jong Hyun Moon ◽

Myung Hwan Oh ◽

Jin Jang

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Electron Field Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

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Organo-Functionalization of Silicon Nanocrystals Synthesized by Inductively Coupled Plasma Chemical Vapor Deposition

Bulletin of the Korean Chemical Society ◽

10.1002/bkcs.10758 ◽

2016 ◽

Vol 37 (5) ◽

pp. 705-712

Author(s):

Don-Sung Lee ◽

Dong-Hoe Choe ◽

Seung-Wan Yoo ◽

Jung-Hyung Kim ◽

Hyun-Dam Jeong

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Silicon Nanocrystals ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Exploring High Refractive Index Silicon-Rich Nitride Films by Low-Temperature Inductively Coupled Plasma Chemical Vapor Deposition and Applications for Integrated Waveguides

ACS Applied Materials & Interfaces ◽

10.1021/acsami.5b06329 ◽

2015 ◽

Vol 7 (39) ◽

pp. 21884-21889 ◽

Author(s):

Doris K. T. Ng ◽

Qian Wang ◽

Ting Wang ◽

Siu-Kit Ng ◽

Yeow-Teck Toh ◽

...

Keyword(s):

Refractive Index ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

High Refractive Index ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Non-catalytic direct synthesis of graphene on Si (111) wafers by using inductively-coupled plasma chemical vapor deposition

Journal of the Korean Physical Society ◽

10.3938/jkps.69.536 ◽

2016 ◽

Vol 69 (4) ◽

pp. 536-540

Author(s):

Sung Won Hwang ◽

Hyunho Shin ◽

Bongsoo Lee ◽

Suk-Ho Choi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Direct Synthesis ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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High-density inductively coupled plasma chemical vapor deposition of silicon nitride for solar cell application

Solar Energy Materials and Solar Cells ◽

10.1016/s0927-0248(02)00053-3 ◽

2002 ◽

Vol 74 (1-4) ◽

pp. 97-105 ◽

Author(s):

I.O Parm ◽

K Kim ◽

D.G Lim ◽

J.H Lee ◽

J.H Heo ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Solar Cell Application ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Effects of substrate temperature on structural, optical and morphological properties of hydrogenated nanocrystalline silicon thin films prepared by inductively coupled plasma chemical vapor deposition

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-015-3426-0 ◽

2015 ◽

Vol 26 (10) ◽

pp. 7790-7796 ◽

Author(s):

Dingyu Yang ◽

Xinghua Zhu ◽

Hui Sun ◽

Xiuying Gao ◽

Xu Li

Keyword(s):

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Morphological Properties ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Silicon Thin Films

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The effect of r.f. substrate bias on the properties of carbon nitride films produced by an inductively coupled plasma chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2004.08.134 ◽

2005 ◽

Vol 193 (1-3) ◽

pp. 152-156 ◽

Author(s):

H.Y. Lee ◽

D.K. Lee ◽

D.H. Kang ◽

J.J. Lee ◽

J.H. Joo

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Carbon Nitride ◽

Chemical Vapor ◽

Substrate Bias ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Inductively coupled plasma chemical vapor deposition silicon nitride for passivation of In 0.83 Ga 0.17 As photodiodes

Infrared Physics & Technology ◽

10.1016/j.infrared.2014.06.003 ◽

2014 ◽

Vol 67 ◽

pp. 197-201 ◽

Author(s):

Ming Shi ◽

Xiumei Shao ◽

Hengjing Tang ◽

Tao Li ◽

Yunji Wang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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