Growth of nanocrystalline TiO2 thin films and crystal anisotropy of anatase phase deposited by direct current reactive magnetron sputtering

2013 ◽  
Vol 139 (2-3) ◽  
pp. 979-987 ◽  
Author(s):  
Bimal K. Sarma ◽  
Arup R. Pal ◽  
Heremba Bailung ◽  
Joyanti Chutia
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Anatase Phase ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Tio2 Thin Films ◽  
Nanocrystalline Tio2 ◽  
Crystal Anisotropy

scholarly journals PHOTOCATALYTIC TIO THIN FILMS FABRICATED BY DC REACTIVE MAGNETRON SPUTTERING

2009 ◽  
Vol 12 (3) ◽  
pp. 16-23
Author(s):  
Thu Thi Hanh Vu ◽  
Chi Huu Nguyen ◽  
Hieu Van Le ◽  
Dat Thanh Huynh ◽  
Ngoc Kim Phan
Keyword(s):  
Thin Films ◽  
Methylene Blue ◽  
Magnetron Sputtering ◽  
Uv Light ◽  
Anatase Phase ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Tio2 Thin Films ◽  
Vis Spectroscopy ◽  
Dc Reactive Magnetron Sputtering

Titanium dioxide thin films that were deposited by unbalanced DC reactive magnetron sputtering on glass substrates have a high crystal structure and large surfac especially getting the anatase phase at the fairly low temperature substrates T, = 446K . The films were charaterized by X-ray diffraction, attomic force AFM, UV-vis spectroscopy. The photocatalytic properties of TiO2 thin films were tested with the degradation methylene blue MB under UV light irradiation. The best fabricated photocatalytic TiOthin films were found with such parameters: gas ratio 0 Ar = 0,06; sputtering power P, = 275W (1p = 0,5 A; Vp = 550V); target - substrate distance h = 4cm; pressure p = 13 mtorr, film thickness d = 660 nm and substrate temperature Tg = 485 K. These films also have a reused probability several times without decreasing amount of Methylene Blue (MB) degradation.

scholarly journals PHOTOCATALYTIC TIO THIN FILMS FABRICATED BY DC REACTIVE MAGNETRON SPUTTERING

2009 ◽  
Vol 16 (3) ◽  
pp. 16-23
Author(s):  
Thu Thi Hanh Vu ◽  
Chi Huu Nguyen ◽  
Hieu Van Le ◽  
Dat Thanh Huynh ◽  
Ngoc Kim Phan
Keyword(s):  
Thin Films ◽  
Methylene Blue ◽  
Magnetron Sputtering ◽  
Uv Light ◽  
Anatase Phase ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Tio2 Thin Films ◽  
Vis Spectroscopy ◽  
Dc Reactive Magnetron Sputtering

Titanium dioxide thin films that were deposited by unbalanced DC reactive magnetron sputtering on glass substrates have a high crystal structure and large surfac especially getting the anatase phase at the fairly low temperature substrates T, = 446K . The films were charaterized by X-ray diffraction, attomic force AFM, UV-vis spectroscopy. The photocatalytic properties of TiO2 thin films were tested with the degradation methylene blue MB under UV light irradiation. The best fabricated photocatalytic TiOthin films were found with such parameters: gas ratio 0 Ar = 0,06; sputtering power P, = 275W (1p = 0,5 A; Vp = 550V); target - substrate distance h = 4cm; pressure p = 13 mtorr, film thickness d = 660 nm and substrate temperature Tg = 485 K. These films also have a reused probability several times without decreasing amount of Methylene Blue (MB) degradation.

A Study on the Preparation of TiO2-xNx Films by Reactive Deposition and Their Absorption Properties in Visible Region

2005 ◽  
Vol 475-479 ◽  
pp. 1223-1226 ◽  
Author(s):  
Ming Zhao ◽  
Da Ming Zhuang ◽  
Gong Zhang ◽  
Ling Fang ◽  
Min Sheng Wu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Absorption Edge ◽  
Visible Region ◽  
Reactive Magnetron Sputtering ◽  
Tio2 Films ◽  
Reactive Magnetron ◽  
Tio2 Thin Films ◽  
Doped Tio2 ◽  
Nitrogen Doped

The nitrogen-doped TiO2 thin films were prepared by mid-frequency alternative reactive magnetron sputtering technique. The N concentration of the nitrogen-doped TiO2 thin films was analyzed by XPS. And the absorption spectra of the films in ultraviolet and visible region were also investigated. The results show that the mid-frequency alternative reactive magnetron sputtering technique is a convenient method for growing TiO2-xNx. Annealing the nitrogen-doped TiO2 thin film in nitrogen atmosphere under 380°C is helpful for increase the concentration of nitrogen in the film, but the ratio of N2 in reactive gas is mainly influence the concentration of nitrogen in the Ti-N bond in the TiO2 film. The increase of the thickness of nitrogen-doped TiO2 films will enhance the absorbability of the film in the ultraviolet and visible region. The wavelength of the absorption edge of TiO2-xNx film with 1.5% nitrogen shift to 441nm from 387nm, which is the absorption edge for undoped TiO2 films.

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