scholarly journals Controlled photocatalytic activity of TiO2 inverse opal structures with atomic layer deposited (ALD) metal oxide thin films

2021 ◽  
pp. 125533
Author(s):  
Khai Pham ◽  
Segolene Pelisset ◽  
Niko Kinnunen ◽  
Petri Karvinen ◽  
Tommi K. Hakala ◽  
...  
Keyword(s):  
Thin Films ◽  
Photocatalytic Activity ◽  
Metal Oxide ◽  
Atomic Layer ◽  
Inverse Opal ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films

Selective Atomic Layer Deposition of Metal Oxide Thin Films on Patterned Self-Assembled Monolayers Formed by Microcontact Printing

2007 ◽  
Vol 7 (11) ◽  
pp. 3758-3764
Author(s):  
Byoung H. Lee ◽  
Myung M. Sung
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Microcontact Printing ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films ◽  
Si Substrates ◽  
Layer Deposition ◽  
Assembled Monolayers

We demonstrate a selective atomic layer deposition of TiO2, ZrO2, and ZnO thin films on patterned alkylsiloxane self-assembled monolayers. Microcontact printing was done to prepare patterned monolayers of the alkylsiloxane on Si substrates. The patterned monolayers define and direct the selective deposition of the metal oxide thin films using atomic layer deposition. The selective atomic layer deposition is based on the fact that the metal oxide thin films are selectively deposited only on the regions exposing the silanol groups of the Si substrates because the regions covered with the alkylsiloxane monolayers do not have any functional group to react with precursors.

Selective Atomic Layer Deposition of Metal Oxide Thin Films on Patterned Self-Assembled Monolayers Formed by Microcontact Printing

2007 ◽  
Vol 7 (11) ◽  
pp. 3758-3764 ◽  
Author(s):  
Byoung H. Lee ◽  
Myung M. Sung
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Microcontact Printing ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films ◽  
Si Substrates ◽  
Layer Deposition ◽  
Assembled Monolayers

We demonstrate a selective atomic layer deposition of TiO2, ZrO2, and ZnO thin films on patterned alkylsiloxane self-assembled monolayers. Microcontact printing was done to prepare patterned monolayers of the alkylsiloxane on Si substrates. The patterned monolayers define and direct the selective deposition of the metal oxide thin films using atomic layer deposition. The selective atomic layer deposition is based on the fact that the metal oxide thin films are selectively deposited only on the regions exposing the silanol groups of the Si substrates because the regions covered with the alkylsiloxane monolayers do not have any functional group to react with precursors.

Atomic layer deposition of metal-oxide thin films on cellulose fibers

2018 ◽  
Vol 71 (11-13) ◽  
pp. 2043-2052 ◽  
Author(s):  
Ortal Lidor-shalev ◽  
Yacov Carmiel ◽  
Nikolaos Pliatsikas ◽  
Panos Patsalas ◽  
Yitzhak Mastai
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Atomic Layer ◽  
Cellulose Fibers ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films ◽  
Layer Deposition

scholarly journals Chemical and Structural Configuration of Pt-Doped Metal Oxide Thin Films Prepared by Atomic Layer Deposition

2019 ◽  
Vol 31 (23) ◽  
pp. 9673-9683
Author(s):  
Ranjith K. Ramachandran ◽  
Matthias Filez ◽  
Eduardo Solano ◽  
Hilde Poelman ◽  
Matthias M. Minjauw ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Atomic Layer ◽  
Structural Configuration ◽  
Oxide Thin Films ◽  
Metal Oxide Thin Films ◽  
Layer Deposition
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