Effect of arsenic doping on charge relaxation process in silicon nitride film for capacitive RF MEMS switch application

2016 ◽  
Vol 162 ◽  
pp. 89-92 ◽  
Author(s):  
Zaijun Cheng ◽  
Xiaohua Huang ◽  
Haibo Huang ◽  
Kaiying Wang ◽  
Gang Li
2013 ◽  
Vol 774-776 ◽  
pp. 1677-1680
Author(s):  
Zhong Liang Deng ◽  
Sen Fan ◽  
Cai Hu Chen ◽  
Hua Gong

In this paper, the design, optimization and equivalent circuit model for a K-band capacitive RF MEMS switch are presented. The fixed-fixed switch is designed with folded structures on the high-resistance silicon substrate, by using gold as the beam and silicon nitride as the dielectric layer. The resulting switch working on 25.2GHz exhibits the performance with insertion loss less than 0.20dB, isolation more than 40dB and the drive voltage less than 16V by simulation.


2020 ◽  
Vol 12 ◽  
Author(s):  
Pampa Debnath ◽  
Ujjwal Mondal ◽  
Arpan Deyasi

Aim:: Computation of loss factors for one-bit RF MEMS switch over Ku, K and Ka-band for two different insulating substrates. Objective:: Numerical investigation of return loss, insertion loss, isolation loss are computed under both actuated and unactuated states for two different insulating substrates of the 1-bit RF MEMS switch, and corresponding up and down-capacitances are obtained. Methods:: The unique characteristics of a 1-bit RF MEMS switch of providing higher return loss under both actuated and unactuated states and also of isolation loss with negligible insertion loss makes it as a prime candidate for phase shifter application. This is presented in this manuscript with a keen focus on improvement capability by changing transmission line width, and also of overlap area; where dielectric constant of the substrate also plays a vital role. Results:: The present work exhibits very low down-capacitance over the spectrum whereas considerable amount of up-capacitance. Also when overall performance in terms of all loss parameters are considered, switch provides very low insertion loss, good return loss under actuated state and standard isolation loss. Conclusion:: Reduction of transmission line width of about 33% improved the performance of the switch by increasing isolation loss. Isolation loss of -40 dB is obtained at actuated condition in higher microwave spectra for SiO 2 at higher overlap area. Down capacitance of ~ 1dB is obtained which is novel as compared with other published literature. Moreover, a better combination of both return loss, isolation loss and insertion loss are reported in this present work compared with all other published data so far.


Author(s):  
Mehrdad Khodapanahandeh ◽  
Akbar Babaeihaselghobi ◽  
Habib Badri Ghavifekr

Author(s):  
K. Srinivasa Rao ◽  
Ch. Gopi Chand ◽  
Reshmi Maity ◽  
N. P. Maity ◽  
K. Girija Sravani

2014 ◽  
Vol 50 (23) ◽  
pp. 1720-1722 ◽  
Author(s):  
A. Attaran ◽  
R. Rashidzadeh ◽  
R. Muscedere

Author(s):  
Z. Wang ◽  
B. Jensen ◽  
J.L. Volakis ◽  
K. Saitou ◽  
K. Kurabayashi
Keyword(s):  
Rf Mems ◽  

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