Mobility improvement of LTPS thin film transistor using stacked capping layer

2021 ◽  
pp. 111591
Author(s):  
Taeyong Kim ◽  
Donggi Shin ◽  
Jinsu Park ◽  
Duy Phong Pham ◽  
Junsin Yi

2015 ◽  
Vol 594 ◽  
pp. 293-298 ◽  
Author(s):  
Jun Young Choi ◽  
SangSig Kim ◽  
Dae Hwan Kim ◽  
Sang Yeol Lee


2013 ◽  
Vol 2013 ◽  
pp. 1-8 ◽  
Author(s):  
P. T. Tue ◽  
T. Miyasako ◽  
E. Tokumitsu ◽  
T. Shimoda

We adopted a lanthanum oxide capping layer between semiconducting channel and insulator layers for fabrication of a ferroelectric-gate thin-film transistor memory (FGT) which uses solution-processed indium-tin-oxide (ITO) and lead-zirconium-titanate (PZT) film as a channel layer and a gate insulator, respectively. Good transistor characteristics such as a high “on/off” current ratio, high channel mobility, and a large memory window of 108, 15.0 cm2 V−1 s−1, and 3.5 V were obtained, respectively. Further, a correlation between effective coercive voltage, charge injection effect, and FGT’s memory window was investigated. It is found that the charge injection from the channel to the insulator layer, which occurs at a high electric field, dramatically influences the memory window. The memory window’s enhancement can be explained by a dual effect of the capping layer: (1) a reduction of the charge injection and (2) an increase of effective coercive voltage dropped on the insulator.



2012 ◽  
Vol 12 ◽  
pp. e18-e23 ◽  
Author(s):  
Musarrat Hasan ◽  
Ji-Young Oh ◽  
Jonghyurk Park ◽  
Sang Chul Lim ◽  
Hee-Ok Kim ◽  
...  






2020 ◽  
Vol 59 (12) ◽  
pp. 126503
Author(s):  
Tsung-Kuei Kang ◽  
Che-Fu Hsu ◽  
Han-Wen Liu ◽  
Feng-Tso Chien ◽  
Cheng-Li Lin






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