Sputtered growth of high mobility InN thin films on different substrates using Cu-ZnO buffer layer

2017 ◽  
Vol 71 ◽  
pp. 166-173 ◽  
Author(s):  
Umar Bashir ◽  
Zainuriah Hassan ◽  
Naser M. Ahmed ◽  
Ammar Oglat ◽  
A.S. Yusof
2004 ◽  
Vol 262 (1-4) ◽  
pp. 456-460 ◽  
Author(s):  
Yuantao Zhang ◽  
Guotong Du ◽  
Boyang Liu ◽  
HuiChao Zhu ◽  
Tianpeng Yang ◽  
...  

2017 ◽  
Vol 206 ◽  
pp. 117-120 ◽  
Author(s):  
David Coathup ◽  
Zheng Li ◽  
Xiaojing Zhu ◽  
Haitao Ye

2010 ◽  
Vol 256 (22) ◽  
pp. 6834-6837 ◽  
Author(s):  
Te-Wei Chiu ◽  
Kazuhiko Tonooka ◽  
Naoto Kikuchi

2007 ◽  
Vol 29 (12) ◽  
pp. 1871-1877 ◽  
Author(s):  
T. Schneider ◽  
D. Leduc ◽  
J. Cardin ◽  
C. Lupi ◽  
N. Barreau ◽  
...  

2013 ◽  
Vol 102 (5) ◽  
pp. 051914 ◽  
Author(s):  
Peng You ◽  
Chaojing Lu ◽  
Wanneng Ye ◽  
Lanzhong Hao ◽  
Jun Zhu ◽  
...  

2001 ◽  
Vol 693 ◽  
Author(s):  
Man Young Sung ◽  
Woong-Je Sung ◽  
Yong-Il Lee ◽  
Chun-Il Park ◽  
Woo-Boem Choi ◽  
...  

Abstract:GaN thin films on sapphire were grown by RF magnetron sputtering with ZnO buffer layer. The tremendous mismatch between the lattices of GaN and sapphire can be partly overcome by the use of thin buffer layer of ZnO. The dependence of GaN film quality on ZnO buffer layer was investigated by X-ray diffraction(XRD). The properties of the sputtered GaN are strongly dependent on ZnO buffer layer thickness. The optimum thickness of ZnO buffer layer is around 30nm. Using XRD analysis, we have found the optimal substrate temperature which can grow high quality GaN thin film. In addition, the effect of excimer laser annealing(ELA) on structural and electrical properties of GaN thin films was investigated. The surface roughness and images according to the laser energy density were investigated by atomic force microscopy(AFM) and it was confirmed that the crystallization was improved by increasing laser energy density.


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