scholarly journals Optical properties of PZT thin films deposited on a ZnO buffer layer

2007 ◽  
Vol 29 (12) ◽  
pp. 1871-1877 ◽  
Author(s):  
T. Schneider ◽  
D. Leduc ◽  
J. Cardin ◽  
C. Lupi ◽  
N. Barreau ◽  
...  
2005 ◽  
Vol 369 (1-4) ◽  
pp. 135-142 ◽  
Author(s):  
S.K. Pandey ◽  
A.R. James ◽  
R. Raman ◽  
S.N. Chatterjee ◽  
Anshu Goyal ◽  
...  

2004 ◽  
Vol 262 (1-4) ◽  
pp. 456-460 ◽  
Author(s):  
Yuantao Zhang ◽  
Guotong Du ◽  
Boyang Liu ◽  
HuiChao Zhu ◽  
Tianpeng Yang ◽  
...  

2017 ◽  
Vol 206 ◽  
pp. 117-120 ◽  
Author(s):  
David Coathup ◽  
Zheng Li ◽  
Xiaojing Zhu ◽  
Haitao Ye

2010 ◽  
Vol 256 (22) ◽  
pp. 6834-6837 ◽  
Author(s):  
Te-Wei Chiu ◽  
Kazuhiko Tonooka ◽  
Naoto Kikuchi

2005 ◽  
Vol 486-487 ◽  
pp. 626-629 ◽  
Author(s):  
Chul Ho Park ◽  
Young Gook Son

The MFS and MFIS structures were prepared on the Si and PbO/Si substrate by the r.f. magnetron sputtering method. When the PbO buffer layer was inserted between the PZT thin film and Si substrate, the crystallization of the PZT thin films was considerably improved, and the processing temperature was lowered. Compared with the MFS structure, memory window values of the MFIS structure with the buffer layer were considerably improved. In particular, in the MFIS structure, the maximum value of the memory window is 2.0 V under the applied voltage of 9V for Pt/PZT (200 nm, 400ı)/PbO (80 nm)/Si structures with the PbO buffer layer deposited at the substrate temperature of 300ı.


RSC Advances ◽  
2013 ◽  
Vol 3 (17) ◽  
pp. 5926 ◽  
Author(s):  
J. R. Rani ◽  
Juhwan Lim ◽  
Juyeong Oh ◽  
Dukhan Kim ◽  
Dongil Lee ◽  
...  

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