Effect of oxygen annealing temperature on properties of spatial atomic layer deposited aluminum-doped zinc oxide films

2021 ◽  
Vol 133 ◽  
pp. 105929
Author(s):  
Chia-Hsun Hsu ◽  
Xin-Peng Geng ◽  
Wan-Yu Wu ◽  
Ming-Jie Zhao ◽  
Pao-Hsun Huang ◽  
...  
2011 ◽  
Vol 176 (3) ◽  
pp. 237-241 ◽  
Author(s):  
G. Luka ◽  
L. Wachnicki ◽  
B.S. Witkowski ◽  
T.A. Krajewski ◽  
R. Jakiela ◽  
...  

2011 ◽  
Vol 1315 ◽  
Author(s):  
Paul R. Chalker ◽  
Paul A. Marshall ◽  
Simon Romani ◽  
Matthew J. Rosseinsky ◽  
Simon Rushworth ◽  
...  

ABSTRACTThin transparent conducting oxide (TCO) films of gallium-doped zinc oxide have been deposited on glass substrates by atomic layer deposition (ALD) using diethyl zinc, triethyl gallium and water vapour as precursors. The gallium-doped zinc oxide films were deposited over the temperature range 100-350°C. Transmission electron microscopy reveals that the as-deposited films are polycrystalline in character. The electrical resistivity of the gallium-doped zinc oxide films was evaluated using four-point probe and contactless measurement methods as a function of film thickness. The lowest sheet resistance of 16 Ω/☐ was measured from a film thickness of 400nm and a gallium content of 5 atomic percent. The electron Hall mobility of this film was 12.3 cm2/Vs. The visible transmittance of the films was 78% with a haze of 0.2%.


2013 ◽  
Vol 123 (5) ◽  
pp. 899-903 ◽  
Author(s):  
R. Ratajczak ◽  
A. Stonert ◽  
E. Guziewicz ◽  
S. Gierałtowska ◽  
T.A. Krajewski ◽  
...  

2014 ◽  
Vol 31 (11) ◽  
pp. 1411-1423 ◽  
Author(s):  
K. Ravichandran ◽  
N. Jabena Begum ◽  
S. Snega ◽  
B. Sakthivel

2020 ◽  
Vol 126 (11) ◽  
Author(s):  
Mohamed Fathy Hasaneen ◽  
M. M. Abd El-Raheem ◽  
Mahrous R. Ahmed

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