scholarly journals Controlled growth of atomically thin transition metal dichalcogenides via chemical vapor deposition method

2020 ◽  
Vol 8 ◽  
pp. 100098
Author(s):  
J. Wang ◽  
T. Li ◽  
Q. Wang ◽  
W. Wang ◽  
R. Shi ◽  
...  
Nanoscale ◽  
2019 ◽  
Vol 11 (36) ◽  
pp. 17065-17072
Author(s):  
Peijian Wang ◽  
Siyuan Luo ◽  
Lincoln Boyle ◽  
Hao Zeng ◽  
Shaoming Huang

We report controlled fractal growth of atomically thin transition metal dichalcogenides (TMDCs) by chemical vapor deposition, with morphological evolution from dendritic to triangular.


Nanoscale ◽  
2021 ◽  
Author(s):  
Anh Tuan Hoang ◽  
Kairui Qu ◽  
Xiang Chen ◽  
Jong-Hyun Ahn

This article reviews the latest advances in the synthesis of wafer-scale thin films using chemical vapor deposition and solution-based methods and various device applications.


2019 ◽  
Vol 1 (3) ◽  
pp. 953-960 ◽  
Author(s):  
Mei Er Pam ◽  
Yumeng Shi ◽  
Junping Hu ◽  
Xiaoxu Zhao ◽  
Jiadong Dan ◽  
...  

Transition metal oxide powders have been widely used as the growth precursors for monolayer transition metal dichalcogenides (TMDCs) in chemical vapor deposition (CVD).


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