Fluoride thin film formation with low optical absorption by gas cluster ion beam assisted deposition

2007 ◽  
Vol 261 (1-2) ◽  
pp. 656-659 ◽  
Author(s):  
S. Nakazawa ◽  
N. Toyoda ◽  
K. Mochiji ◽  
T. Mitamura ◽  
I. Yamada
Keyword(s):  
Thin Film ◽  
Optical Absorption ◽  
Film Formation ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition ◽  
Cluster Ion ◽  
Thin Film Formation ◽  
Gas Cluster Ion Beam

Optical thin film formation by gas-cluster ion beam assisted deposition

1999 ◽  
Author(s):  
H. Katsumata ◽  
J. Matsuo ◽  
T. Nishihara ◽  
T. Tachibana ◽  
K. Yamada ◽  
...  
Keyword(s):  
Thin Film ◽  
Film Formation ◽  
Ion Beam ◽  
Optical Thin Film ◽  
Ion Beam Assisted Deposition ◽  
Cluster Ion ◽  
Thin Film Formation ◽  
Gas Cluster Ion Beam

Diamond-like carbon thin film formation by ion-beam-assisted deposition

1994 ◽  
Vol 66 (1-3) ◽  
pp. 514-518 ◽  
Author(s):  
Yoshinori Funada ◽  
Kaoru Awazu ◽  
Kisaburo Shimamura ◽  
Hiroshi Watanabe ◽  
Masaya Iwaki
Keyword(s):  
Thin Film ◽  
Film Formation ◽  
Ion Beam ◽  
Diamond Like Carbon ◽  
Ion Beam Assisted Deposition ◽  
Carbon Thin Film ◽  
Thin Film Formation

Hard DLC film formation by gas cluster ion beam assisted deposition

2003 ◽  
Vol 201 (2) ◽  
pp. 405-412 ◽  
Author(s):  
Teruyuki Kitagawa ◽  
Isao Yamada ◽  
Noriaki Toyoda ◽  
Harushige Tsubakino ◽  
Jiro Matsuo ◽  
...  
Keyword(s):  
Film Formation ◽  
Ion Beam ◽  
Dlc Film ◽  
Ion Beam Assisted Deposition ◽  
Cluster Ion ◽  
Gas Cluster Ion Beam

Smoothing Thin Films with Gas-Cluster Ion Beams

2000 ◽  
Vol 614 ◽  
Author(s):  
D.B. Fenner ◽  
J. Hautala ◽  
L.P. Allen ◽  
J.A. Greer ◽  
W.J. Skinner ◽  
...  
Keyword(s):  
Thin Film ◽  
Ion Beam ◽  
Spin Valve ◽  
High Spatial Frequency ◽  
Atomic Scale ◽  
Force Microscopy ◽  
Tantalum Films ◽  
Cluster Ion Beams ◽  
Cluster Ion ◽  
Gas Cluster Ion Beam

ABSTRACTThin-film magnetic sensor and memory devices in future generations may benefit from a processing tool for final-step etching and smoothing of surfaces to nearly an atomic scale. Gas-cluster ion-beam (GCIB) systems make possible improved surface sputtering and processing for many types of materials. We propose application of GCIB processing as a key smoothing step in thin-film magnetic-materials technology, especially spin-valve GMR. Results of argon GCIB etching and smoothing of surfaces of alumina, silicon, permalloy and tantalum films are reported. No accumulating roughness or damage is observed. The distinct scratches and tracks seen in atomic-force microscopy of CMP-processed surfaces, are removed almost entirely by subsequent GCIB processing. The technique primarily reduces high spatial-frequency roughness and renders the topographic surface elevations more nearly gaussian (randomly distributed).

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