scholarly journals Quantifying erosion and retention of silicon carbide due to D plasma irradiation in a high-flux linear plasma device

2021 ◽  
Vol 26 ◽  
pp. 100939
Author(s):  
G. Sinclair ◽  
T. Abrams ◽  
S. Bringuier ◽  
D.M. Thomas ◽  
L. Holland ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
High Flux ◽  
Plasma Irradiation ◽  
Plasma Device ◽  
Linear Plasma

scholarly journals Fluence Dependence of Surface Morphology and Deuterium Retention in W Bulks and Nanocrystalline W Films Exposed to Deuterium Plasma

2021 ◽  
Vol 11 (4) ◽  
pp. 1619
Author(s):  
Jing Yan ◽  
Xia Li ◽  
Kaigui Zhu
Keyword(s):  
Surface Morphology ◽  
Thermal Desorption Spectroscopy ◽  
Low Energy ◽  
High Flux ◽  
Deuterium Plasma ◽  
Vacancy Clusters ◽  
Plasma Irradiation ◽  
Deuterium Retention ◽  
Fluence Dependence ◽  
Scanning Electron

The surface morphology of pure W bulks and nanocrystalline tungsten films was investigated after exposure to a low-energy (100 eV/D), high-flux (1.8 × 1021 D·m−2s−1) deuterium plasma. Nanocrystalline tungsten films of 6 μm thickness were deposited on tungsten bulks and exposed to deuterium plasma at various fluences ranging from 1.30 × 1025 to 5.18 × 1025 D·m−2. Changes in surface morphology from before to after irradiation were studied with scanning electron microscopy (SEM). The W bulk exposed to low-fluence plasma (1.30 × 1025 D·m−2) shows blisters. The blisters on the W bulk irradiated to higher-fluence plasma are much larger (~2 µm). The blisters on the surface of W films are smaller in size and lower in density than those of the W bulks. In addition, the modifications exhibit the appearance of cracks below the surface after deuterium plasma irradiation. It is suggested that the blisters are caused by the diffusion and aggregation of the deuterium-vacancy clusters. The deuterium retention of the W bulks and nanocrystalline tungsten films was studied using thermal desorption spectroscopy (TDS). The retention of deuterium in W bulks and W films increases with increasing deuterium plasma fluence when irradiated at 500 K.

An upgraded LIBS system on linear plasma device PSI-2 for in situ diagnostics of plasma-facing materials

2019 ◽  
Vol 146 ◽  
pp. 96-99 ◽  
Author(s):  
X. Jiang ◽  
G. Sergienko ◽  
B. Schweer ◽  
S. Möller ◽  
M. Freisinger ◽  
...  
Keyword(s):  
Plasma Device ◽  
Plasma Facing Materials ◽  
Linear Plasma ◽  
In Situ Diagnostics

scholarly journals Plasma flow in peripheral region of detached plasma in linear plasma device

2016 ◽  
Vol 23 (1) ◽  
pp. 012511 ◽  
Author(s):  
Y. Hayashi ◽  
N. Ohno ◽  
S. Kajita ◽  
H. Tanaka
Keyword(s):  
Plasma Flow ◽  
Peripheral Region ◽  
Plasma Device ◽  
Linear Plasma

scholarly journals Surface roughness effect on Mo physical sputtering and re-deposition in the linear plasma device PSI-2 predicted by ERO2.0

2019 ◽  
Vol 19 ◽  
pp. 13-18 ◽  
Author(s):  
A. Eksaeva ◽  
D. Borodin ◽  
J. Romazanov ◽  
A. Kirschner ◽  
A. Kreter ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Roughness Effect ◽  
Physical Sputtering ◽  
Plasma Device ◽  
Linear Plasma

scholarly journals Linear Plasma Device PSI-2 for Plasma-Material Interaction Studies

2015 ◽  
Vol 68 (1) ◽  
pp. 8-14 ◽  
Author(s):  
A. Kreter ◽  
C. Brandt ◽  
A. Huber ◽  
S. Kraus ◽  
S. MÖller ◽  
...  
Keyword(s):  
Interaction Studies ◽  
Plasma Device ◽  
Plasma Material Interaction ◽  
Material Interaction ◽  
Linear Plasma

scholarly journals ERO2.0 modelling of the effects of surface roughness on molybdenum erosion and redeposition in the PSI-2 linear plasma device

2020 ◽  
Vol T171 ◽  
pp. 014057 ◽  
Author(s):  
A Eksaeva ◽  
D Borodin ◽  
J Romazanov ◽  
A Kreter ◽  
A Pospieszczyk ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Plasma Device ◽  
Linear Plasma

Design of magnetic configurations for the linear plasma device LEAD

2019 ◽  
Vol 144 ◽  
pp. 81-86 ◽  
Author(s):  
H. Liu ◽  
Y. Yu ◽  
Z.H. Wang ◽  
M. Xu ◽  
T. Che ◽  
...  
Keyword(s):  
Plasma Device ◽  
Linear Plasma

Numerical Study of Neutral Gas Transport in Linear Plasma Device

2007 ◽  
Vol 46 (4A) ◽  
pp. 1680-1691 ◽  
Author(s):  
Maxim Ignatenko ◽  
Masafumi Azumi ◽  
Masatoshi Yagi ◽  
Shunjiro Shinohara ◽  
Sanae-I Itoh ◽  
...  
Keyword(s):  
Gas Transport ◽  
Numerical Study ◽  
Neutral Gas ◽  
Plasma Device ◽  
Linear Plasma

scholarly journals Surface morphology changes of silicon carbide by helium plasma irradiation

2018 ◽  
Vol 16 ◽  
pp. 145-148
Author(s):  
N. Yamashita ◽  
K. Omori ◽  
Y. Kimura ◽  
T. Hinoki ◽  
K. Ibano ◽  
...  
Keyword(s):  
Silicon Carbide ◽  
Surface Morphology ◽  
Helium Plasma ◽  
Plasma Irradiation ◽  
Morphology Changes
Sign in / Sign up

Export Citation Format

Share Document