Argon plasma inductively coupled plasma reactive ion etching study for smooth sidewall thin film lithium niobate waveguide application
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2004 ◽
Vol 43
(1)
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pp. 82-85
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2014 ◽
Vol 211
(10)
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pp. 2343-2346
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Reactive ion etching of Pb(Zr[sub x]Ti[sub 1−x])O[sub 3] thin films in an inductively coupled plasma
1998 ◽
Vol 16
(4)
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pp. 1894
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2002 ◽
Vol 41
(Part 2, No. 8B)
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pp. L910-L912
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