Effects of Oxygen Flux on the Aluminum Doped Zinc Oxide Thin Films By Direct Current Magnetron Sputtering

Physics Procedia ◽

10.1016/j.phpro.2012.03.619 ◽

2012 ◽

Vol 32 ◽

pp. 687-695 ◽

Author(s):

L.N. Li ◽

Y. Zhao ◽

X.L. Chen ◽

J. Sun ◽

X.D. Zhang

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Oxygen Flux ◽

Oxide Thin Films ◽

Direct Current Magnetron Sputtering ◽

Aluminum Doped Zinc Oxide

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Characteristics of indium zinc oxide thin films prepared by direct current magnetron sputtering for flexible solar cells

Solar Energy Materials and Solar Cells ◽

10.1016/j.solmat.2010.02.016 ◽

2011 ◽

Vol 95 (1) ◽

pp. 264-269 ◽

Author(s):

Yu Bin Xiao ◽

Seon Mi Kong ◽

Eun Ho Kim ◽

Chee Won Chung

Keyword(s):

Solar Cells ◽

Magnetron Sputtering ◽

Direct Current ◽

Oxide Thin Films ◽

Indium Zinc Oxide ◽

Direct Current Magnetron Sputtering

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Influence of addition of indium and of post-annealing on structural, electrical and optical properties of gallium-doped zinc oxide thin films deposited by direct-current magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2015.03.068 ◽

2015 ◽

Vol 583 ◽

pp. 201-204 ◽

Author(s):

Duy Phong Pham ◽

Huu Truong Nguyen ◽

Bach Thang Phan ◽

Van Dung Hoang ◽

Shinya Maenosono ◽

...

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Direct Current ◽

Oxide Thin Films ◽

Electrical And Optical Properties ◽

Post Annealing ◽

Direct Current Magnetron Sputtering

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Surface textured molybdenum doped zinc oxide thin films prepared for thin film solar cells using pulsed direct current magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2011.03.014 ◽

2011 ◽

Vol 519 (16) ◽

pp. 5571-5576 ◽

Author(s):

Y.C. Lin ◽

B.L. Wang ◽

W.T. Yen ◽

C.H. Shen

Keyword(s):

Thin Film ◽

Solar Cells ◽

Magnetron Sputtering ◽

Direct Current ◽

Thin Film Solar Cells ◽

Oxide Thin Films ◽

Direct Current Magnetron Sputtering ◽

Pulsed Direct Current

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Comparative study of zinc oxide and aluminum doped zinc oxide transparent thin films grown by direct current magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2006.11.151 ◽

2007 ◽

Vol 515 (16) ◽

pp. 6562-6566 ◽

Author(s):

M. Suchea ◽

S. Christoulakis ◽

N. Katsarakis ◽

T. Kitsopoulos ◽

G. Kiriakidis

Keyword(s):

Magnetron Sputtering ◽

Comparative Study ◽

Direct Current ◽

Direct Current Magnetron Sputtering ◽

Aluminum Doped Zinc Oxide

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Zinc Oxide Thin Films Fabricated with Direct Current Magnetron Sputtering Deposition Technique

10.1063/1.3573740 ◽

2011 ◽

Author(s):

Jian-Wei Hoon ◽

Kah-Yoong Chan ◽

Jegenathan Krishnasamy ◽

Teck-Yong Tou

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Deposition Technique ◽

Oxide Thin Films ◽

Sputtering Deposition ◽

Direct Current Magnetron Sputtering

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Spatial distribution of plasma parameters by a dual thermal-electrostatic probe in RF and DC magnetron sputtering discharges during deposition of aluminum doped zinc oxide thin films

Plasma Sources Science and Technology ◽

10.1088/1361-6595/abec25 ◽

2021 ◽

Vol 30 (4) ◽

pp. 045002

Author(s):

Mihai-Andrei Petrea ◽

Eugen Stamate

Keyword(s):

Spatial Distribution ◽

Magnetron Sputtering ◽

Dc Magnetron Sputtering ◽

Oxide Thin Films ◽

Plasma Parameters ◽

Aluminum Doped Zinc Oxide ◽

Electrostatic Probe

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Hall mobility of cuprous oxide thin films deposited by reactive direct-current magnetron sputtering

Applied Physics Letters ◽

10.1063/1.3589810 ◽

2011 ◽

Vol 98 (19) ◽

pp. 192115 ◽

Author(s):

Yun Seog Lee ◽

Mark T. Winkler ◽

Sin Cheng Siah ◽

Riley Brandt ◽

Tonio Buonassisi

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Hall Mobility ◽

Cuprous Oxide ◽

Oxide Thin Films ◽

Direct Current Magnetron Sputtering

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Influence of oxygen and argon flow on properties of aluminum-doped zinc oxide thin films prepared by magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2014.07.021 ◽

2014 ◽

Vol 566 ◽

pp. 32-37 ◽

Author(s):

Hua Zhu ◽

Hemei Wang ◽

Wenqiong Wan ◽

Shijin Yu ◽

XiaoWei Feng

Keyword(s):

Magnetron Sputtering ◽

Oxide Thin Films ◽

Aluminum Doped Zinc Oxide

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Deposition and Characterization of Cuprous Oxide Thin Films by Direct Current Magnetron Sputtering

Advanced Science Engineering and Medicine ◽

10.1166/asem.2015.1801 ◽

2015 ◽

Vol 7 (11) ◽

pp. 990-994

Author(s):

V. Vignesh ◽

R. Niveditha ◽

R. Nirmala ◽

R.T. Rajendrakumar ◽

R. Navamathavan

Keyword(s):

Magnetron Sputtering ◽

Direct Current ◽

Cuprous Oxide ◽

Oxide Thin Films ◽

Direct Current Magnetron Sputtering

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Room temperature DC magnetron sputtering deposition of hydrogenated aluminum doped zinc oxide thin films on polyethylene terephthalate substrates

Materials Letters ◽

10.1016/j.matlet.2013.05.063 ◽

2013 ◽

Vol 106 ◽

pp. 363-365 ◽

Author(s):

Ke Zhu ◽

Ye Yang ◽

Tiefeng Wei ◽

Ruiqin Tan ◽

Ping Cui ◽

...

Keyword(s):

Magnetron Sputtering ◽

Polyethylene Terephthalate ◽

Room Temperature ◽

Dc Magnetron Sputtering ◽

Oxide Thin Films ◽

Sputtering Deposition ◽

Aluminum Doped Zinc Oxide

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