Room temperature DC magnetron sputtering deposition of hydrogenated aluminum doped zinc oxide thin films on polyethylene terephthalate substrates

2013 ◽  
Vol 106 ◽  
pp. 363-365 ◽  
Author(s):  
Ke Zhu ◽  
Ye Yang ◽  
Tiefeng Wei ◽  
Ruiqin Tan ◽  
Ping Cui ◽  
...  
2011 ◽  
Vol 519 (20) ◽  
pp. 6910-6915 ◽  
Author(s):  
Hyeongsik Park ◽  
Kyungsoo Jang ◽  
Krishna Kumar ◽  
Shihyun Ahn ◽  
Jaehyun Cho ◽  
...  

2001 ◽  
Vol 685 ◽  
Author(s):  
Elvira Fortunato ◽  
Patrícia Nunes ◽  
António Marques ◽  
Daniel Costa ◽  
Hugo Águas ◽  
...  

AbstractAluminium doped zinc oxide thin films (ZnO:Al) have been deposited on polyester (Mylar type D, 100 μm thickness) substrates at room temperature by r.f. magnetron sputtering. The structural, morphological, optical and electrical properties of the deposited films have been studied. The samples are polycrystalline with a hexagonal wurtzite structure and a strong crystallographic c-axis orientation (002) perpendicular to the substrate surface. The ZnO:Al thin films with 85% transmittance in the visible and infra-red region and a resistivity as low as 3.6×10−2 ωcm have been obtained, as deposited. The obtained results are comparable to those ones obtained on glass substrates, opening a new field of low cost, light weight, small volume, flexible and unbreakable large area optoelectronic devices.


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