Hall mobility of cuprous oxide thin films deposited by reactive direct-current magnetron sputtering
2011 ◽
Vol 98
(19)
◽
pp. 192115
◽
Yun Seog Lee
◽
Mark T. Winkler
◽
Sin Cheng Siah
◽
Riley Brandt
◽
Tonio Buonassisi
2015 ◽
Vol 7
(11)
◽
pp. 990-994
V. Vignesh
◽
R. Niveditha
◽
R. Nirmala
◽
R.T. Rajendrakumar
◽
R. Navamathavan
2012 ◽
Vol 32
◽
pp. 687-695
◽
L.N. Li
◽
Y. Zhao
◽
X.L. Chen
◽
J. Sun
◽
X.D. Zhang
2011 ◽
Vol 95
(1)
◽
pp. 264-269
◽
Yu Bin Xiao
◽
Seon Mi Kong
◽
Eun Ho Kim
◽
Chee Won Chung
Ruijin Hong
◽
Jinxia Wang
◽
Chunxian Tao
◽
Dawei Zhang
2015 ◽
Vol 583
◽
pp. 201-204
◽
Duy Phong Pham
◽
Huu Truong Nguyen
◽
Bach Thang Phan
◽
Van Dung Hoang
◽
Shinya Maenosono
◽
...
2011 ◽
Vol 519
(16)
◽
pp. 5571-5576
◽
Y.C. Lin
◽
B.L. Wang
◽
W.T. Yen
◽
C.H. Shen
2008 ◽
Vol 35
(12)
◽
pp. 2031-2035
曾维强 Zeng Weiqiang
◽
姚建可 Yao Jianke
◽
贺洪波 He Hongbo
◽
邵建达 Shao Jianda
2014 ◽
Vol 552
◽
pp. 218-224
◽
Huafu Zhang
◽
Zhiming Wu
◽
Dawei Yan
◽
Xiangdong Xu
◽
Yadong Jiang
2014 ◽
Vol 559
◽
pp. 53-57
◽
Hyun-Jun Lee
◽
Pung-Keun Song
Jian-Wei Hoon
◽
Kah-Yoong Chan
◽
Jegenathan Krishnasamy
◽
Teck-Yong Tou